175 related articles for article (PubMed ID: 36756605)
1. Influence of deposition temperature on microstructure and gas-barrier properties of Al
Ren Y; Sun X; Chen L; Wei H; Feng B; Chen J
RSC Adv; 2023 Jan; 13(6):3766-3772. PubMed ID: 36756605
[TBL] [Abstract][Full Text] [Related]
2. Flexible Ultrathin Chip-Film Patch for Electronic Component Integration and Encapsulation using Atomic Layer-Deposited Al
Passlack U; Simon N; Bucher V; Harendt C; Stieglitz T; Burghartz JN
ACS Appl Mater Interfaces; 2023 Mar; 15(12):16221-16231. PubMed ID: 36939586
[TBL] [Abstract][Full Text] [Related]
3. Complete stress release in monolayer ALD-Al
Li Z; Wang Z; Chen Z; Feng J; Wang J; Fan S; Sun H; Duan Y
Soft Matter; 2022 Jun; 18(25):4756-4766. PubMed ID: 35703537
[TBL] [Abstract][Full Text] [Related]
4. Al2O3/TiO2 nanolaminate thin film encapsulation for organic thin film transistors via plasma-enhanced atomic layer deposition.
Kim LH; Kim K; Park S; Jeong YJ; Kim H; Chung DS; Kim SH; Park CE
ACS Appl Mater Interfaces; 2014 May; 6(9):6731-8. PubMed ID: 24712401
[TBL] [Abstract][Full Text] [Related]
5. A flexible transparent gas barrier film employing the method of mixing ALD/MLD-grown Al2O3 and alucone layers.
Xiao W; Hui DY; Zheng C; Yu D; Qiang YY; Ping C; Xiang CL; Yi Z
Nanoscale Res Lett; 2015; 10():130. PubMed ID: 25852421
[TBL] [Abstract][Full Text] [Related]
6. Structural, Optical and Electrical Properties of HfO
Kim KM; Jang JS; Yoon SG; Yun JY; Chung NK
Materials (Basel); 2020 Apr; 13(9):. PubMed ID: 32344793
[TBL] [Abstract][Full Text] [Related]
7. Uniformity and passivation research of Al2O3 film on silicon substrate prepared by plasma-enhanced atom layer deposition.
Jia E; Zhou C; Wang W
Nanoscale Res Lett; 2015; 10():129. PubMed ID: 25852420
[TBL] [Abstract][Full Text] [Related]
8. PEALD of SiO
Gebhard M; Mai L; Banko L; Mitschker F; Hoppe C; Jaritz M; Kirchheim D; Zekorn C; de Los Arcos T; Grochla D; Dahlmann R; Grundmeier G; Awakowicz P; Ludwig A; Devi A
ACS Appl Mater Interfaces; 2018 Feb; 10(8):7422-7434. PubMed ID: 29338170
[TBL] [Abstract][Full Text] [Related]
9. Efficient multi-barrier thin film encapsulation of OLED using alternating Al
Wu J; Fei F; Wei C; Chen X; Nie S; Zhang D; Su W; Cui Z
RSC Adv; 2018 Feb; 8(11):5721-5727. PubMed ID: 35539605
[TBL] [Abstract][Full Text] [Related]
10. A Study of Al
Yuan H; Zhang Y; Li Q; Yan W; Zhang X; Ouyang X; Ouyang X; Chen L; Liao B
Materials (Basel); 2023 Feb; 16(5):. PubMed ID: 36903070
[TBL] [Abstract][Full Text] [Related]
11. Thermally evaporated SiO thin films as a versatile interlayer for plasma-based OLED passivation.
Yun WM; Jang J; Nam S; Kim LH; Seo SJ; Park CE
ACS Appl Mater Interfaces; 2012 Jun; 4(6):3247-53. PubMed ID: 22646486
[TBL] [Abstract][Full Text] [Related]
12. Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications.
Shestaeva S; Bingel A; Munzert P; Ghazaryan L; Patzig C; Tünnermann A; Szeghalmi A
Appl Opt; 2017 Feb; 56(4):C47-C59. PubMed ID: 28158051
[TBL] [Abstract][Full Text] [Related]
13. Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition.
Edy R; Huang X; Guo Y; Zhang J; Shi J
Nanoscale Res Lett; 2013 Feb; 8(1):79. PubMed ID: 23413804
[TBL] [Abstract][Full Text] [Related]
14. Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films.
Mirvakili MN; Van Bui H; van Ommen JR; Hatzikiriakos SG; Englezos P
ACS Appl Mater Interfaces; 2016 Jun; 8(21):13590-600. PubMed ID: 27165172
[TBL] [Abstract][Full Text] [Related]
15. The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition.
Wang ZY; Zhang RJ; Lu HL; Chen X; Sun Y; Zhang Y; Wei YF; Xu JP; Wang SY; Zheng YX; Chen LY
Nanoscale Res Lett; 2015; 10():46. PubMed ID: 25852343
[TBL] [Abstract][Full Text] [Related]
16. Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition.
Kim LH; Jeong YJ; An TK; Park S; Jang JH; Nam S; Jang J; Kim SH; Park CE
Phys Chem Chem Phys; 2016 Jan; 18(2):1042-9. PubMed ID: 26661064
[TBL] [Abstract][Full Text] [Related]
17. Study of mechanical degradation of freestanding ALD Al
Lee S; Jeon Y; Oh SJ; Lee SW; Choi KC; Kim TS; Kwon JH
Mater Horiz; 2023 Oct; 10(10):4488-4500. PubMed ID: 37534735
[TBL] [Abstract][Full Text] [Related]
18. Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors.
Ma Q; Zheng HM; Shao Y; Zhu B; Liu WJ; Ding SJ; Zhang DW
Nanoscale Res Lett; 2018 Jan; 13(1):4. PubMed ID: 29318402
[TBL] [Abstract][Full Text] [Related]
19. Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO
Huang PH; Zhang ZX; Hsu CH; Wu WY; Ou SL; Huang CJ; Wuu DS; Lien SY; Zhu WZ
Nanomaterials (Basel); 2022 Aug; 12(16):. PubMed ID: 36014724
[TBL] [Abstract][Full Text] [Related]
20. Low-Temperature Process for Atomic Layer Chemical Vapor Deposition of an Al2O3 Passivation Layer for Organic Photovoltaic Cells.
Kim H; Lee J; Sohn S; Jung D
J Nanosci Nanotechnol; 2016 May; 16(5):5285-90. PubMed ID: 27483916
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
