These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

204 related articles for article (PubMed ID: 36818590)

  • 21. Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H
    Kim DH; Ramesh R; Nandi DK; Bae JS; Kim SH
    Nanotechnology; 2021 Feb; 32(7):075405. PubMed ID: 33108773
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Low-Temperature Atomic Layer Deposition of MoS
    Jurca T; Moody MJ; Henning A; Emery JD; Wang B; Tan JM; Lohr TL; Lauhon LJ; Marks TJ
    Angew Chem Int Ed Engl; 2017 Apr; 56(18):4991-4995. PubMed ID: 28371057
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Atomic-layer soft plasma etching of MoS2.
    Xiao S; Xiao P; Zhang X; Yan D; Gu X; Qin F; Ni Z; Han ZJ; Ostrikov KK
    Sci Rep; 2016 Jan; 6():19945. PubMed ID: 26813335
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Remote Plasma Oxidation and Atomic Layer Etching of MoS2.
    Zhu H; Qin X; Cheng L; Azcatl A; Kim J; Wallace RM
    ACS Appl Mater Interfaces; 2016 Jul; 8(29):19119-26. PubMed ID: 27386734
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Scalable high-mobility MoS2 thin films fabricated by an atmospheric pressure chemical vapor deposition process at ambient temperature.
    Huang CC; Al-Saab F; Wang Y; Ou JY; Walker JC; Wang S; Gholipour B; Simpson RE; Hewak DW
    Nanoscale; 2014 Nov; 6(21):12792-7. PubMed ID: 25226424
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C
    Metzler D; Li C; Engelmann S; Bruce RL; Joseph EA; Oehrlein GS
    J Chem Phys; 2017 Feb; 146(5):052801. PubMed ID: 28178847
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100 °C Using Sequential Surface Reactions.
    Sprenger JK; Cavanagh AS; Sun H; Wahl KJ; Roshko A; George SM
    Chem Mater; 2016; 28():. PubMed ID: 31092972
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Low-Temperature As-Grown Crystalline β-Ga
    Ilhom S; Mohammad A; Shukla D; Grasso J; Willis BG; Okyay AK; Biyikli N
    ACS Appl Mater Interfaces; 2021 Feb; 13(7):8538-8551. PubMed ID: 33566585
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniques.
    Lee BH; Anderson VR; George SM
    ACS Appl Mater Interfaces; 2014 Oct; 6(19):16880-7. PubMed ID: 25203487
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Large-Area Deposition of MoS2 by Pulsed Laser Deposition with In Situ Thickness Control.
    Serna MI; Yoo SH; Moreno S; Xi Y; Oviedo JP; Choi H; Alshareef HN; Kim MJ; Minary-Jolandan M; Quevedo-Lopez MA
    ACS Nano; 2016 Jun; 10(6):6054-61. PubMed ID: 27219117
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Structural Aspects of MoS
    Mattinen M; Chen W; Dawley RA; Verheijen MA; Hensen EJM; Kessels WMM; Bol AA
    ACS Catal; 2024 Jul; 14(13):10089-10101. PubMed ID: 38988655
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Surface Phenomena During Plasma-Assisted Atomic Layer Etching of SiO
    Gasvoda RJ; van de Steeg AW; Bhowmick R; Hudson EA; Agarwal S
    ACS Appl Mater Interfaces; 2017 Sep; 9(36):31067-31075. PubMed ID: 28796486
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Mechanism understanding in cryo atomic layer etching of SiO
    Antoun G; Tillocher T; Lefaucheux P; Faguet J; Maekawa K; Dussart R
    Sci Rep; 2021 Jan; 11(1):357. PubMed ID: 33431975
    [TBL] [Abstract][Full Text] [Related]  

  • 34. Towards a uniform and large-scale deposition of MoS2 nanosheets via sulfurization of ultra-thin Mo-based solid films.
    Vangelista S; Cinquanta E; Martella C; Alia M; Longo M; Lamperti A; Mantovan R; Basset FB; Pezzoli F; Molle A
    Nanotechnology; 2016 Apr; 27(17):175703. PubMed ID: 26984949
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices.
    Gerritsen SH; Chittock NJ; Vandalon V; Verheijen MA; Knoops HCM; Kessels WMM; Mackus AJM
    ACS Appl Nano Mater; 2022 Dec; 5(12):18116-18126. PubMed ID: 36583128
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Electrochemically deposited molybdenum disulfide surfaces enable polymer adsorption studies using quartz crystal microbalance with dissipation monitoring (QCM-D).
    O'Bryan CS; Rosenfeld J; Zhang A; Keller AW; Bendejacq D; Kagan CR; Murray CB; Lee D; Composto RJ
    J Colloid Interface Sci; 2022 May; 614():522-531. PubMed ID: 35121510
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Effect of Co-Reactants on Interfacial Oxidation in Atomic Layer Deposition of Oxides on Metal Surfaces.
    Swarup JV; Chuang HR; You AL; Engstrom JR
    ACS Appl Mater Interfaces; 2024 Apr; 16(13):16983-16995. PubMed ID: 38506615
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Wafer-Scale Synthesis of Reliable High-Mobility Molybdenum Disulfide Thin Films via Inhibitor-Utilizing Atomic Layer Deposition.
    Jeon W; Cho Y; Jo S; Ahn JH; Jeong SJ
    Adv Mater; 2017 Dec; 29(47):. PubMed ID: 29094458
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Aluminum Precursor Interactions with Alkali Compounds in Thermal Atomic Layer Etching and Deposition Processes.
    Hennessy J; Jewell AD; Jones JP; Crouch GM; Nikzad S
    ACS Appl Mater Interfaces; 2021 Jan; 13(3):4723-4730. PubMed ID: 33428384
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Wafer-scale growth of MoS2 thin films by atomic layer deposition.
    Pyeon JJ; Kim SH; Jeong DS; Baek SH; Kang CY; Kim JS; Kim SK
    Nanoscale; 2016 May; 8(20):10792-8. PubMed ID: 27166838
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 11.