These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

116 related articles for article (PubMed ID: 37043671)

  • 21. Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD.
    Lemaire PC; King M; Parsons GN
    J Chem Phys; 2017 Feb; 146(5):052811. PubMed ID: 28178812
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C
    Metzler D; Li C; Engelmann S; Bruce RL; Joseph EA; Oehrlein GS
    J Chem Phys; 2017 Feb; 146(5):052801. PubMed ID: 28178847
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Inherently Area-Selective Atomic Layer Deposition of Manganese Oxide through Electronegativity-Induced Adsorption.
    Li YC; Cao K; Lan YX; Zhang JM; Gong M; Wen YW; Shan B; Chen R
    Molecules; 2021 May; 26(10):. PubMed ID: 34065464
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Area-Selective Atomic Layer Deposition of TiN Using Trimethoxy(octadecyl)silane as a Passivation Layer.
    Zheng L; He W; Spampinato V; Franquet A; Sergeant S; Gendt S; Armini S
    Langmuir; 2020 Nov; 36(44):13144-13154. PubMed ID: 33104359
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111).
    Gharachorlou A; Detwiler MD; Gu XK; Mayr L; Klötzer B; Greeley J; Reifenberger RG; Delgass WN; Ribeiro FH; Zemlyanov DY
    ACS Appl Mater Interfaces; 2015 Aug; 7(30):16428-39. PubMed ID: 26158796
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films.
    Zyulkov I; Madhiwala V; Voronina E; Snelgrove M; Bogan J; O'Connor R; De Gendt S; Armini S
    ACS Appl Mater Interfaces; 2020 Jan; 12(4):4678-4688. PubMed ID: 31913003
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Stepwise mechanism and H2O-assisted hydrolysis in atomic layer deposition of SiO2 without a catalyst.
    Fang GY; Xu LN; Wang LG; Cao YQ; Wu D; Li AD
    Nanoscale Res Lett; 2015; 10():68. PubMed ID: 25897298
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Synthesis of a Spatially Confined, Highly Durable, and Fully Exposed Pd Cluster Catalyst via Sequential Site-Selective Atomic Layer Deposition.
    Zuo Y; Wang Z; Zhao H; Zhao L; Zhang L; Yi B; Bao W; Zhang Y; Su L; Yu Y; Xie J
    ACS Appl Mater Interfaces; 2022 Mar; 14(12):14466-14473. PubMed ID: 35312273
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices.
    Ansari MZ; Nandi DK; Janicek P; Ansari SA; Ramesh R; Cheon T; Shong B; Kim SH
    ACS Appl Mater Interfaces; 2019 Nov; 11(46):43608-43621. PubMed ID: 31633331
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Characteristics of SiO2/Si3N4/SiO2 stacked-gate dielectrics obtained via atomic-layer deposition.
    Lee YS; Lee YH; Ju HJ; Lee WJ; Lee HS; Rha SK
    J Nanosci Nanotechnol; 2011 Jul; 11(7):5795-9. PubMed ID: 22121609
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Nanoscale Au-ZnO Heterostructure Developed by Atomic Layer Deposition Towards Amperometric H
    Xu H; Wei Z; Verpoort F; Hu J; Zhuiykov S
    Nanoscale Res Lett; 2020 Feb; 15(1):41. PubMed ID: 32065320
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Bottom-up plasma-enhanced atomic layer deposition of SiO
    Choi Y; Kim T; Lee H; Park J; Park J; Ryu D; Jeon W
    Sci Rep; 2022 Sep; 12(1):15756. PubMed ID: 36131082
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Self-Formation of a Ru/ZnO Multifunctional Bilayer for the Next-Generation Interconnect Technology via Area-Selective Atomic Layer Deposition.
    Mori Y; Cheon T; Kotsugi Y; Kim YH; Park Y; Ansari MZ; Mohapatra D; Jang Y; Bae JS; Kwon W; Kim G; Park YB; Lee HB; Song W; Kim SH
    Small; 2023 Aug; 19(34):e2300290. PubMed ID: 37127866
    [TBL] [Abstract][Full Text] [Related]  

  • 34. In situ auger electron spectroscopy study of atomic layer deposition: growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces.
    Park KJ; Terry DB; Stewart SM; Parsons GN
    Langmuir; 2007 May; 23(11):6106-12. PubMed ID: 17461600
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Room-temperature atomic layer deposition of SiO
    Alfrisany NM; Somogyi-Ganss E; Tam L; Hatton BD; Sodhi RNS; De Souza GM
    J Mech Behav Biomed Mater; 2022 Oct; 134():105410. PubMed ID: 35969930
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Atomic layer deposition SiO
    Yan Y; Ji Y; Yan J; Hu X; Zhang Q; Liu M; Zhang F
    J Mech Behav Biomed Mater; 2021 Feb; 114():104197. PubMed ID: 33221163
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Area-Selective Atomic Layer Deposition on Metal/Dielectric Patterns: Amphiphobic Coating, Vaporizable Inhibitors, and Regenerative Processing.
    Chang CW; Tseng YH; Hsu CS; Chen JT
    ACS Appl Mater Interfaces; 2023 Jun; 15(23):28817-28824. PubMed ID: 37264593
    [TBL] [Abstract][Full Text] [Related]  

  • 38. The Effect of Surface Terminations on the Initial Stages of TiO
    Parke T; Silva-Quinones D; Wang GT; Teplyakov AV
    Chemphyschem; 2023 Apr; 24(7):e202200724. PubMed ID: 36516050
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Selective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects.
    Zyulkov I; Krishtab M; De Gendt S; Armini S
    ACS Appl Mater Interfaces; 2017 Sep; 9(36):31031-31041. PubMed ID: 28820569
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Local Structure and Point-Defect-Dependent Area-Selective Atomic Layer Deposition Approach for Facile Synthesis of p-Cu
    de Melo C; Jullien M; Ghanbaja J; Montaigne F; Pierson JF; Soldera F; Rigoni F; Almqvist N; Vomiero A; Mücklich F; Horwat D
    ACS Appl Mater Interfaces; 2018 Oct; 10(43):37671-37678. PubMed ID: 30261135
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 6.