These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

114 related articles for article (PubMed ID: 37264593)

  • 1. Area-Selective Atomic Layer Deposition on Metal/Dielectric Patterns: Amphiphobic Coating, Vaporizable Inhibitors, and Regenerative Processing.
    Chang CW; Tseng YH; Hsu CS; Chen JT
    ACS Appl Mater Interfaces; 2023 Jun; 15(23):28817-28824. PubMed ID: 37264593
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal-Dielectric Patterns.
    Minaye Hashemi FS; Birchansky BR; Bent SF
    ACS Appl Mater Interfaces; 2016 Dec; 8(48):33264-33272. PubMed ID: 27934166
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition.
    Minaye Hashemi FS; Prasittichai C; Bent SF
    ACS Nano; 2015 Sep; 9(9):8710-7. PubMed ID: 26181140
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide.
    Sampson MD; Emery JD; Pellin MJ; Martinson ABF
    ACS Appl Mater Interfaces; 2017 Oct; 9(39):33429-33436. PubMed ID: 28379011
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition.
    Liu TL; Zeng L; Nardi KL; Hausmann DM; Bent SF
    Langmuir; 2021 Oct; 37(39):11637-11645. PubMed ID: 34550696
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al
    Seo S; Yeo BC; Han SS; Yoon CM; Yang JY; Yoon J; Yoo C; Kim HJ; Lee YB; Lee SJ; Myoung JM; Lee HB; Kim WH; Oh IK; Kim H
    ACS Appl Mater Interfaces; 2017 Nov; 9(47):41607-41617. PubMed ID: 29111636
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer Deposition-Defectivity Reduction by Monolayer Design.
    Wojtecki R; Mettry M; Fine Nathel NF; Friz A; De Silva A; Arellano N; Shobha H
    ACS Appl Mater Interfaces; 2018 Nov; 10(44):38630-38637. PubMed ID: 30335930
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Area-Selective Atomic Layer Deposition of Two-Dimensional WS
    Balasubramanyam S; Merkx MJM; Verheijen MA; Kessels WMM; Mackus AJM; Bol AA
    ACS Mater Lett; 2020 May; 2(5):511-518. PubMed ID: 32421046
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Substrate-Dependent Study of Chain Orientation and Order in Alkylphosphonic Acid Self-Assembled Monolayers for ALD Blocking.
    Bobb-Semple D; Zeng L; Cordova I; Bergsman DS; Nordlund D; Bent SF
    Langmuir; 2020 Nov; 36(43):12849-12857. PubMed ID: 33079543
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films.
    Zyulkov I; Madhiwala V; Voronina E; Snelgrove M; Bogan J; O'Connor R; De Gendt S; Armini S
    ACS Appl Mater Interfaces; 2020 Jan; 12(4):4678-4688. PubMed ID: 31913003
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning.
    Fang M; Ho JC
    ACS Nano; 2015 Sep; 9(9):8651-4. PubMed ID: 26351731
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation.
    Singh JA; Thissen NFW; Kim WH; Johnson H; Kessels WMM; Bol AA; Bent SF; Mackus AJM
    Chem Mater; 2018 Feb; 30(3):663-670. PubMed ID: 29503508
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Area-selective atomic layer deposition of lead sulfide: nanoscale patterning and DFT simulations.
    Lee W; Dasgupta NP; Trejo O; Lee JR; Hwang J; Usui T; Prinz FB
    Langmuir; 2010 May; 26(9):6845-52. PubMed ID: 20099790
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Area-Selective Atomic Layer Deposition of TiN Using Trimethoxy(octadecyl)silane as a Passivation Layer.
    Zheng L; He W; Spampinato V; Franquet A; Sergeant S; Gendt S; Armini S
    Langmuir; 2020 Nov; 36(44):13144-13154. PubMed ID: 33104359
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition.
    Liu TL; Nardi KL; Draeger N; Hausmann DM; Bent SF
    ACS Appl Mater Interfaces; 2020 Sep; 12(37):42226-42235. PubMed ID: 32805867
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Selective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects.
    Zyulkov I; Krishtab M; De Gendt S; Armini S
    ACS Appl Mater Interfaces; 2017 Sep; 9(36):31031-31041. PubMed ID: 28820569
    [TBL] [Abstract][Full Text] [Related]  

  • 17. From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity.
    Mackus AJM; Merkx MJM; Kessels WMM
    Chem Mater; 2019 Jan; 31(1):2-12. PubMed ID: 30774194
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Controlled Synthesis of Pd/Pt Core Shell Nanoparticles Using Area-selective Atomic Layer Deposition.
    Cao K; Zhu Q; Shan B; Chen R
    Sci Rep; 2015 Feb; 5():8470. PubMed ID: 25683469
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD.
    Lemaire PC; King M; Parsons GN
    J Chem Phys; 2017 Feb; 146(5):052811. PubMed ID: 28178812
    [TBL] [Abstract][Full Text] [Related]  

  • 20. A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation.
    Kim WH; Minaye Hashemi FS; Mackus AJ; Singh J; Kim Y; Bobb-Semple D; Fan Y; Kaufman-Osborn T; Godet L; Bent SF
    ACS Nano; 2016 Apr; 10(4):4451-8. PubMed ID: 26950397
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 6.