These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
161 related articles for article (PubMed ID: 37299688)
21. Effect of Process Temperature on Density and Electrical Characteristics of Hf Kim HG; Hong DH; Yoo JH; Lee HC Nanomaterials (Basel); 2022 Feb; 12(3):. PubMed ID: 35159892 [TBL] [Abstract][Full Text] [Related]
22. Thickness scaling of atomic-layer-deposited HfO2 films and their application to wafer-scale graphene tunnelling transistors. Jeong SJ; Gu Y; Heo J; Yang J; Lee CS; Lee MH; Lee Y; Kim H; Park S; Hwang S Sci Rep; 2016 Feb; 6():20907. PubMed ID: 26861833 [TBL] [Abstract][Full Text] [Related]
23. Temperature- and Frequency-Dependent Ferroelectric Characteristics of Metal-Ferroelectric-Metal Capacitors with Atomic-Layer-Deposited Undoped HfO Jang CH; Kim HS; Kim H; Cha HY Materials (Basel); 2022 Mar; 15(6):. PubMed ID: 35329549 [TBL] [Abstract][Full Text] [Related]
24. Effects of Oxygen Flow during Fabrication by Magnetron Sputtering on Structure and Performance of Zr-Doped HfO Xi Y; Liu L; Zhao J; Qin X; Zhang J; Zhang C; Liu W Materials (Basel); 2023 Aug; 16(16):. PubMed ID: 37629850 [TBL] [Abstract][Full Text] [Related]
26. Ferroelectricity and antiferroelectricity of doped thin HfO2-based films. Park MH; Lee YH; Kim HJ; Kim YJ; Moon T; Kim KD; Müller J; Kersch A; Schroeder U; Mikolajick T; Hwang CS Adv Mater; 2015 Mar; 27(11):1811-31. PubMed ID: 25677113 [TBL] [Abstract][Full Text] [Related]
27. Ultrathin ZnS and ZnO Interfacial Passivation Layers for Atomic-Layer-Deposited HfO2 Films on InP Substrates. Kim SH; Joo SY; Jin HS; Kim WB; Park TJ ACS Appl Mater Interfaces; 2016 Aug; 8(32):20880-4. PubMed ID: 27467383 [TBL] [Abstract][Full Text] [Related]
28. Ta Wei CY; Shen B; Ding P; Han P; Li AD; Xia YD; Xu B; Yin J; Liu ZG Sci Rep; 2017 Jul; 7(1):5988. PubMed ID: 28729693 [TBL] [Abstract][Full Text] [Related]
29. Integration of lead-free ferroelectric on HfO2/Si (100) for high performance non-volatile memory applications. Kundu S; Maurya D; Clavel M; Zhou Y; Halder NN; Hudait MK; Banerji P; Priya S Sci Rep; 2015 Feb; 5():8494. PubMed ID: 25683062 [TBL] [Abstract][Full Text] [Related]
30. Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser-induced damage thresholds. Wei Y; Pan F; Zhang Q; Ma P Nanoscale Res Lett; 2015; 10():44. PubMed ID: 25852341 [TBL] [Abstract][Full Text] [Related]
31. Characterization of Structural, Optical, Corrosion, and Mechanical Properties of HfO Mańkowska E; Mazur M; Kalisz M; Grobelny M; Domaradzki J; Wojcieszak D Materials (Basel); 2023 Jul; 16(14):. PubMed ID: 37512279 [TBL] [Abstract][Full Text] [Related]
32. Hole and electron trapping in HfO Spassov D; Paskaleva A; Krajewski TA; Guziewicz E; Luka G Nanotechnology; 2018 Dec; 29(50):505206. PubMed ID: 30260800 [TBL] [Abstract][Full Text] [Related]
33. Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniques. Lee BH; Anderson VR; George SM ACS Appl Mater Interfaces; 2014 Oct; 6(19):16880-7. PubMed ID: 25203487 [TBL] [Abstract][Full Text] [Related]
35. Charge-trapping characteristics of Al2O3/Cu/Al2O3 nanolaminate structures prepared through atomic layer deposition. Lee BK; Kim SH; Park BK; Lee SS; Hwang JH; Chung TM; Lee YK; Kim CG; An KS J Nanosci Nanotechnol; 2011 Jul; 11(7):5887-91. PubMed ID: 22121626 [TBL] [Abstract][Full Text] [Related]
36. Physical Properties of an Ultrathin Al Xu Y; Chen H; Xu H; Chen M; Zhou P; Li S; Zhang G; Shi W; Yang X; Ding X; Wei B ACS Appl Mater Interfaces; 2023 Apr; 15(13):16874-16881. PubMed ID: 36942855 [TBL] [Abstract][Full Text] [Related]
37. The Properties of Cu Thin Films on Ru Depending on the ALD Temperature. Yoon HC; Shin JH; Park HS; Suh SJ J Nanosci Nanotechnol; 2015 Feb; 15(2):1601-4. PubMed ID: 26353698 [TBL] [Abstract][Full Text] [Related]
38. Effect of Al Acharya J; Goul R; Romine D; Sakidja R; Wu J ACS Appl Mater Interfaces; 2019 Aug; 11(33):30368-30375. PubMed ID: 31356739 [TBL] [Abstract][Full Text] [Related]
39. ~3-nm ZnO Nanoislands Deposition and Application in Charge Trapping Memory Grown by Single ALD Step. El-Atab N; Chowdhury F; Ulusoy TG; Ghobadi A; Nazirzadeh A; Okyay AK; Nayfeh A Sci Rep; 2016 Dec; 6():38712. PubMed ID: 27991492 [TBL] [Abstract][Full Text] [Related]