These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
111 related articles for article (PubMed ID: 37420999)
1. Single Layer Lift-Off of CSAR62 for Dense Nanostructured Patterns. Ohlin H; Frisk T; Vogt U Micromachines (Basel); 2023 Mar; 14(4):. PubMed ID: 37420999 [TBL] [Abstract][Full Text] [Related]
2. Optimization of e-beam lithography parameters for nanofabrication of sub-50 nm gold nanowires and nanogaps based on a bilayer lift-off process. Sahin O; Albayrak OM; Yapici MK Nanotechnology; 2024 Jul; 35(39):. PubMed ID: 38959870 [TBL] [Abstract][Full Text] [Related]
3. Fabrication of plasmonic structures with well-controlled nanometric features: a comparison between lift-off and ion beam etching. Abasahl B; Santschi C; Raziman TV; Martin OJF Nanotechnology; 2021 Aug; 32(47):. PubMed ID: 34348240 [TBL] [Abstract][Full Text] [Related]
4. Investigation of a nanofabrication process to achieve high aspect-ratio nanostructures on a quartz substrate. Mohamed K; Alkaisi MM Nanotechnology; 2013 Jan; 24(1):015302. PubMed ID: 23221357 [TBL] [Abstract][Full Text] [Related]
5. All-Water Etching-Free Electron Beam Lithography for On-Chip Nanomaterials. Wang X; Dai X; Wang H; Wang J; Chen Q; Chen F; Yi Q; Tang R; Gao L; Ma L; Wang C; Wang X; He G; Fei Y; Guan Y; Zhang B; Dai Y; Tu X; Zhang L; Zhang L; Zou G ACS Nano; 2023 Mar; 17(5):4933-4941. PubMed ID: 36802505 [TBL] [Abstract][Full Text] [Related]
6. Bi-Layer nanoimprinting lithography for metal-assisted chemical etching with application on silicon mold replication. Chen WS; Lee YC Nanotechnology; 2023 Oct; 34(50):. PubMed ID: 37703872 [TBL] [Abstract][Full Text] [Related]
7. Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics. Chang C; Sakdinawat A Nat Commun; 2014 Jun; 5():4243. PubMed ID: 24970569 [TBL] [Abstract][Full Text] [Related]
8. Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography. Vila-Comamala J; Gorelick S; Guzenko VA; Färm E; Ritala M; David C Nanotechnology; 2010 Jul; 21(28):285305. PubMed ID: 20562479 [TBL] [Abstract][Full Text] [Related]
9. The fabrication of carbon nanostructures using electron beam resist pyrolysis and nanomachining processes for biosensing applications. Lee JA; Lee KC; Park SI; Lee SS Nanotechnology; 2008 May; 19(21):215302. PubMed ID: 21730570 [TBL] [Abstract][Full Text] [Related]
10. Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing. Radtke M; Nelz R; Slablab A; Neu E Micromachines (Basel); 2019 Oct; 10(11):. PubMed ID: 31653033 [TBL] [Abstract][Full Text] [Related]
11. TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes. Williams J; Faley MI; Vas JV; Lu PH; Dunin-Borkowski RE Beilstein J Nanotechnol; 2024; 15():1-12. PubMed ID: 38213573 [TBL] [Abstract][Full Text] [Related]
12. Double layer lift-off nanofabrication controlled gaps of nanoelectrodes with sub-100 nm by nanoimprint lithography. Wang S; Shi Q; Chai J; Cheng K; Du Z Nanotechnology; 2015 May; 26(18):185301. PubMed ID: 25873043 [TBL] [Abstract][Full Text] [Related]
14. Fabrication of high aspect ratio tungsten nanostructures on ultrathin c-Si membranes for extreme UV applications. Delachat F; Le Drogoff B; Constancias C; Delprat S; Gautier E; Chaker M; Margot J Nanotechnology; 2016 Jan; 27(2):025304. PubMed ID: 26630379 [TBL] [Abstract][Full Text] [Related]
15. Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating. Gorelick S; Guzenko VA; Vila-Comamala J; David C Nanotechnology; 2010 Jul; 21(29):295303. PubMed ID: 20601756 [TBL] [Abstract][Full Text] [Related]
16. Metal nanoparticle arrays via a water-based lift-off scheme using a block copolymer template. Landeke-Wilsmark B; Hägglund C Nanotechnology; 2022 May; 33(32):. PubMed ID: 35579929 [TBL] [Abstract][Full Text] [Related]
17. Precise tailoring of evaporated gold nanocones using electron beam lithography and lift-off. Eschimèse D; Vaurette F; Mélin T; Arscott S Nanotechnology; 2020 May; 31(22):225302. PubMed ID: 32040944 [TBL] [Abstract][Full Text] [Related]
18. Nanofabrication on unconventional substrates using transferred hard masks. Li L; Bayn I; Lu M; Nam CY; Schröder T; Stein A; Harris NC; Englund D Sci Rep; 2015 Jan; 5():7802. PubMed ID: 25588550 [TBL] [Abstract][Full Text] [Related]
19. Nanofabrication of plasmonic structures on insulating substrates by resist-on-metal bilayer lift-off. Hahn C; Amyot-Bourgeois M; Al-Shehab M; Northfield H; Choi Y; Song SH; Tait RN; Berini P Nanotechnology; 2019 Feb; 30(5):054003. PubMed ID: 30511659 [TBL] [Abstract][Full Text] [Related]
20. Metal oxide multilayer hard mask system for 3D nanofabrication. Han Z; Salmi E; Vehkamäki M; Leskelä M; Ritala M Nanotechnology; 2018 Feb; 29(5):055301. PubMed ID: 29215346 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]