These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

132 related articles for article (PubMed ID: 37623792)

  • 21. EUV polarimetry for thin film and surface characterization and EUV phase retarder reflector development.
    Gaballah AEH; Nicolosi P; Ahmed N; Jimenez K; Pettinari G; Gerardino A; Zuppella P
    Rev Sci Instrum; 2018 Jan; 89(1):015108. PubMed ID: 29390727
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Characterization of optical constants for uranium from 10 to 47 nm.
    Brimhall N; Herrick N; Allred DD; Turley RS; Ware M; Peatross J
    Appl Opt; 2010 Mar; 49(9):1581-5. PubMed ID: 20300153
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography.
    Mirkarimi PB; Bajt S; Wall MA
    Appl Opt; 2000 Apr; 39(10):1617-25. PubMed ID: 18345060
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Broadband extreme ultraviolet dispersion measurements using a high-harmonic source.
    Jansen GSM; Liu X; Eikema KSE; Witte S
    Opt Lett; 2019 Aug; 44(15):3625-3628. PubMed ID: 31368928
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Characterisation of engineered defects in extreme ultraviolet mirror substrates using lab-scale extreme ultraviolet reflection ptychography.
    Lu H; Odstrčil M; Pooley C; Biller J; Mebonia M; He G; Praeger M; Juschkin L; Frey J; Brocklesby W
    Ultramicroscopy; 2023 Jul; 249():113720. PubMed ID: 37004492
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Spectroscopic characterization of Si/Mo thin-film stack at extreme ultraviolet range.
    Li YY; Lee YW; Ho TS; Wang JH; Wu IC; Hsu TW; Chen YT; Huang SL
    Opt Lett; 2018 Aug; 43(16):4029-4032. PubMed ID: 30106944
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Design and simulation of an extreme ultraviolet metalens based on the Pancharatnam-Berry phase.
    Mao X; Yu G; Zhao Y; Wei B; Li Z; Yang F; Wang X
    Appl Opt; 2024 Mar; 63(7):1867-1874. PubMed ID: 38437291
    [TBL] [Abstract][Full Text] [Related]  

  • 28. High reflectance ta-C coatings in the extreme ultraviolet.
    Larruquert JI; Rodríguez-de Marcos LV; Méndez JA; Martin PJ; Bendavid A
    Opt Express; 2013 Nov; 21(23):27537-49. PubMed ID: 24514272
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr.
    Larruquert JI; Keski-Kuha RA
    Appl Opt; 2000 Jun; 39(16):2772-81. PubMed ID: 18345201
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Binary mask designs with single- and double-layer absorber stacks for extreme ultraviolet lithography and actinic inspection.
    Park S; Lim JD; Peranantham P; Kang HY; Hwangbo CK; Lee S; Kim SS
    Appl Opt; 2014 Feb; 53(4):A42-7. PubMed ID: 24514247
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Wide-field broadband extreme ultraviolet transmission ptychography using a high-harmonic source.
    Baksh PD; Odstrčil M; Kim HS; Boden SA; Frey JG; Brocklesby WS
    Opt Lett; 2016 Apr; 41(7):1317-20. PubMed ID: 27192225
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas.
    Kunkemöller G; Mass TW; Michel AK; Kim HS; Brose S; Danylyuk S; Taubner T; Juschkin L
    Opt Express; 2015 Oct; 23(20):25487-95. PubMed ID: 26480066
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold.
    Makhotkin IA; Sobierajski R; Chalupský J; Tiedtke K; de Vries G; Störmer M; Scholze F; Siewert F; van de Kruijs RWE; Milov I; Louis E; Jacyna I; Jurek M; Klinger D; Nittler L; Syryanyy Y; Juha L; Hájková V; Vozda V; Burian T; Saksl K; Faatz B; Keitel B; Plönjes E; Schreiber S; Toleikis S; Loch R; Hermann M; Strobel S; Nienhuys HK; Gwalt G; Mey T; Enkisch H
    J Synchrotron Radiat; 2018 Jan; 25(Pt 1):77-84. PubMed ID: 29271755
    [TBL] [Abstract][Full Text] [Related]  

  • 34. Absolute EUV reflectivity measurements using a broadband high-harmonic source and an in situ single exposure reference scheme.
    Abel JJ; Wiesner F; Nathanael J; Reinhard J; Wünsche M; Schmidl G; Gawlik A; Hübner U; Plentz J; Rödel C; Paulus GG; Fuchs S
    Opt Express; 2022 Sep; 30(20):35671-35683. PubMed ID: 36258513
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Circular pellicles formed by Pseudomonas alkylphenolica KL28 are a sophisticated architecture principally designed by matrix substance.
    Song MM; Veeranagouda Y; Ganzorig M; Lee K
    J Microbiol; 2018 Nov; 56(11):790-797. PubMed ID: 30353464
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Ultrafast Time-Resolved Pump-Probe Investigation of Nanosecond Extreme Ultraviolet-Light-Induced Damage Dynamics on B
    Pan L; Li S; Cao J; Wu J; Zhang Z; Wang K; Huang Q; Ma B; Li W; Wang Z
    Nano Lett; 2022 Jul; 22(13):5260-5268. PubMed ID: 35759364
    [TBL] [Abstract][Full Text] [Related]  

  • 37. A table-top EUV focusing optical system with high energy density using a modified Schwarzschild objective and a laser-plasma light source.
    Zhang Z; Li W; Huang Q; Zhang Z; Yi S; Pan L; Xie C; Wachulak P; Fiedorowicz H; Wang Z
    Rev Sci Instrum; 2018 Oct; 89(10):103109. PubMed ID: 30399967
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Detection and characterization of carbon contamination on EUV multilayer mirrors.
    Chen J; Louis E; Lee CJ; Wormeester H; Kunze R; Schmidt H; Schneider D; Moors R; van Schaik W; Lubomska M; Bijkerk F
    Opt Express; 2009 Sep; 17(19):16969-79. PubMed ID: 19770915
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Physico-Chemical Surface Modifications of Polyetheretherketone (PEEK) Using Extreme Ultraviolet (EUV) Radiation and EUV-Induced Nitrogen Plasma.
    Czwartos J; Budner B; Bartnik A; Wachulak P; Fiedorowicz H; Mierczyk Z
    Materials (Basel); 2020 Oct; 13(19):. PubMed ID: 33050110
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Non-contact removal of coadhering and non-coadhering bacterial pairs from pellicle surfaces by sonic brushing and de novo adhesion.
    Busscher HJ; Rustema-Abbing M; Bruinsma GM; de Jager M; Gottenbos B; van der Mei HC
    Eur J Oral Sci; 2003 Dec; 111(6):459-64. PubMed ID: 14632680
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 7.