These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
284 related articles for article (PubMed ID: 37629850)
1. Effects of Oxygen Flow during Fabrication by Magnetron Sputtering on Structure and Performance of Zr-Doped HfO Xi Y; Liu L; Zhao J; Qin X; Zhang J; Zhang C; Liu W Materials (Basel); 2023 Aug; 16(16):. PubMed ID: 37629850 [TBL] [Abstract][Full Text] [Related]
2. Ferroelectricity and antiferroelectricity of doped thin HfO2-based films. Park MH; Lee YH; Kim HJ; Kim YJ; Moon T; Kim KD; Müller J; Kersch A; Schroeder U; Mikolajick T; Hwang CS Adv Mater; 2015 Mar; 27(11):1811-31. PubMed ID: 25677113 [TBL] [Abstract][Full Text] [Related]
3. Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO Lim S; Ahn Y; Won B; Lee S; Park H; Kumar M; Seo H Nanomaterials (Basel); 2024 Aug; 14(17):. PubMed ID: 39269048 [TBL] [Abstract][Full Text] [Related]
4. Stabilizing the ferroelectric phase in HfO Mittmann T; Michailow M; Lomenzo PD; Gärtner J; Falkowski M; Kersch A; Mikolajick T; Schroeder U Nanoscale; 2021 Jan; 13(2):912-921. PubMed ID: 33367444 [TBL] [Abstract][Full Text] [Related]
5. Preparation and characterization of ferroelectric Hf Lee YH; Kim HJ; Moon T; Kim KD; Hyun SD; Park HW; Lee YB; Park MH; Hwang CS Nanotechnology; 2017 Jul; 28(30):305703. PubMed ID: 28562366 [TBL] [Abstract][Full Text] [Related]
6. Hafnium-doped zirconia ferroelectric thin films with excellent endurance at high polarization. Cao Y; Zhang W; Li Y Nanoscale; 2023 Jan; 15(3):1392-1401. PubMed ID: 36594335 [TBL] [Abstract][Full Text] [Related]
7. Improved Ferroelectric Switching Endurance of La-Doped Hf Chernikova AG; Kozodaev MG; Negrov DV; Korostylev EV; Park MH; Schroeder U; Hwang CS; Markeev AM ACS Appl Mater Interfaces; 2018 Jan; 10(3):2701-2708. PubMed ID: 29282976 [TBL] [Abstract][Full Text] [Related]
8. A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf Kim SJ; Mohan J; Kim HS; Hwang SM; Kim N; Jung YC; Sahota A; Kim K; Yu HY; Cha PR; Young CD; Choi R; Ahn J; Kim J Materials (Basel); 2020 Jul; 13(13):. PubMed ID: 32630791 [TBL] [Abstract][Full Text] [Related]
9. Characterization of Structural, Optical, Corrosion, and Mechanical Properties of HfO Mańkowska E; Mazur M; Kalisz M; Grobelny M; Domaradzki J; Wojcieszak D Materials (Basel); 2023 Jul; 16(14):. PubMed ID: 37512279 [TBL] [Abstract][Full Text] [Related]
10. Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr:HfO Choi Y; Han C; Shin J; Moon S; Min J; Park H; Eom D; Lee J; Shin C Sensors (Basel); 2022 May; 22(11):. PubMed ID: 35684705 [TBL] [Abstract][Full Text] [Related]
11. Effects of Thermal Annealing on the Properties of Zirconium-Doped Mg Lin WY; Chien FT; Chiu HC; Sheu JK; Hsueh KP Membranes (Basel); 2021 May; 11(5):. PubMed ID: 34065275 [TBL] [Abstract][Full Text] [Related]
12. Effects of etching process and annealing temperature on the ferroelectric properties of atomic layer deposited Al-doped HfO Ku B; Ma Y; Han H; Xuan W; Choi C Nanotechnology; 2022 Jul; 33(42):. PubMed ID: 35767964 [TBL] [Abstract][Full Text] [Related]
13. Domain Switching Characteristics in Ga-Doped HfO Li YC; Huang T; Li XX; Zhu XN; Zhang DW; Lu HL Nano Lett; 2024 Jun; 24(22):6585-6591. PubMed ID: 38785400 [TBL] [Abstract][Full Text] [Related]
14. Fabrication of Nanopillar Crystalline ITO Thin Films with High Transmittance and IR Reflectance by RF Magnetron Sputtering. Dong L; Zhu G; Xu H; Jiang X; Zhang X; Zhao Y; Yan D; Yuan L; Yu A Materials (Basel); 2019 Mar; 12(6):. PubMed ID: 30909418 [TBL] [Abstract][Full Text] [Related]
15. Impact of Ar Flow Rates on Micro-Structural Properties of WS Akhtaruzzaman M; Shahiduzzaman M; Amin N; Muhammad G; Islam MA; Rafiq KSB; Sopian K Nanomaterials (Basel); 2021 Jun; 11(7):. PubMed ID: 34206518 [TBL] [Abstract][Full Text] [Related]
16. Highly Transparent Conducting Indium Tin Oxide Thin Films Prepared by Radio Frequency Magnetron Sputtering and Thermal Annealing. Parida B; Gil Y; Kim H J Nanosci Nanotechnol; 2019 Mar; 19(3):1455-1462. PubMed ID: 30469205 [TBL] [Abstract][Full Text] [Related]
17. Temperature- and Frequency-Dependent Ferroelectric Characteristics of Metal-Ferroelectric-Metal Capacitors with Atomic-Layer-Deposited Undoped HfO Jang CH; Kim HS; Kim H; Cha HY Materials (Basel); 2022 Mar; 15(6):. PubMed ID: 35329549 [TBL] [Abstract][Full Text] [Related]
18. Comparative Study of Aluminum-Doped Zinc Oxide, Gallium-Doped Zinc Oxide and Indium-Doped Tin Oxide Thin Films Deposited by Radio Frequency Magnetron Sputtering. Khan S; Stamate E Nanomaterials (Basel); 2022 May; 12(9):. PubMed ID: 35564248 [TBL] [Abstract][Full Text] [Related]
19. Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction. Lederer M; Kämpfe T; Vogel N; Utess D; Volkmann B; Ali T; Olivo R; Müller J; Beyer S; Trentzsch M; Seidel K; Eng ALM Nanomaterials (Basel); 2020 Feb; 10(2):. PubMed ID: 32098415 [TBL] [Abstract][Full Text] [Related]
20. Superior and stable ferroelectric properties of hafnium-zirconium-oxide thin films deposited Kim HB; Jung M; Oh Y; Lee SW; Suh D; Ahn JH Nanoscale; 2021 May; 13(18):8524-8530. PubMed ID: 33908540 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]