143 related articles for article (PubMed ID: 37703872)
21. 3D ordered nanostructures fabricated by nanosphere lithography using an organometallic etch mask.
Ling XY; Acikgoz C; Phang IY; Hempenius MA; Reinhoudt DN; Vancso GJ; Huskens J
Nanoscale; 2010 Aug; 2(8):1455-60. PubMed ID: 20820734
[TBL] [Abstract][Full Text] [Related]
22. A water-processable cellulose-based resist for advanced nanofabrication.
Dore C; Osmond J; Mihi A
Nanoscale; 2018 Sep; 10(37):17884-17892. PubMed ID: 30221647
[TBL] [Abstract][Full Text] [Related]
23. Nanoimprint Replication of Biomimetic, Multilevel Undercut Nanostructures.
Muehlberger M; Ruttloff S; Nees D; Moharana A; Belegratis MR; Taus P; Kopp S; Wanzenboeck HD; Prinz A; Fechtig D
Nanomaterials (Basel); 2021 Apr; 11(4):. PubMed ID: 33923974
[TBL] [Abstract][Full Text] [Related]
24. Analysis of etching mechanism and etched slope control of silicon for nanoimprinting lithography.
Ham YH; Kim Y; Baek KH; Do LM; Kwon KH; Park KB
J Nanosci Nanotechnol; 2011 Jul; 11(7):6523-7. PubMed ID: 22121749
[TBL] [Abstract][Full Text] [Related]
25. Interfacial Interactions during Demolding in Nanoimprint Lithography.
Li M; Chen Y; Luo W; Cheng X
Micromachines (Basel); 2021 Mar; 12(4):. PubMed ID: 33805114
[TBL] [Abstract][Full Text] [Related]
26. Anisotropic remastering for reducing feature sizes on UV nanoimprint lithography replica molds.
Lausecker E; Grydlik M; Brehm M; Bergmair I; Mühlberger M; Fromherz T; Bauer G
Nanotechnology; 2012 Apr; 23(16):165302. PubMed ID: 22469617
[TBL] [Abstract][Full Text] [Related]
27. Continuous roller nanoimprinting: next generation lithography.
Peng Z; Zhang Y; Choi CLR; Zhang P; Wu T; Chan YK
Nanoscale; 2023 Jul; 15(27):11403-11421. PubMed ID: 37376894
[TBL] [Abstract][Full Text] [Related]
28. Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy.
Zhan Y; Deng L; Dai W; Qiu Y; Sun S; Sun D; Hu B; Guan J
Nanomaterials (Basel); 2024 Jun; 14(12):. PubMed ID: 38921874
[TBL] [Abstract][Full Text] [Related]
29. Metal-assisted chemical etching of silicon: a review.
Huang Z; Geyer N; Werner P; de Boor J; Gösele U
Adv Mater; 2011 Jan; 23(2):285-308. PubMed ID: 20859941
[TBL] [Abstract][Full Text] [Related]
30. Nanoimprinting for high-throughput replication of geometrically precise pillars in fused silica to regulate cell behavior.
Ganjian M; Modaresifar K; Rompolas D; Fratila-Apachitei LE; Zadpoor AA
Acta Biomater; 2022 Mar; 140():717-729. PubMed ID: 34875357
[TBL] [Abstract][Full Text] [Related]
31. Ultrasonic-Assisted Electrochemical Nanoimprint Lithography: Forcing Mass Transfer to Enhance the Localized Etching Rate of GaAs.
Liu B; Han L; Xu H; Su JJ; Zhan D
Chem Asian J; 2023 Sep; 18(18):e202300491. PubMed ID: 37493590
[TBL] [Abstract][Full Text] [Related]
32. Non-Lithographic Silicon Micromachining Using Inkjet and Chemical Etching.
Hoshian S; Gaspar C; Vasara T; Jahangiri F; Jokinen V; Franssila S
Micromachines (Basel); 2016 Dec; 7(12):. PubMed ID: 30404394
[TBL] [Abstract][Full Text] [Related]
33. Fabrication of arrays of tapered silicon micro-/nano-pillars by metal-assisted chemical etching and anisotropic wet etching.
Yamada K; Yamada M; Maki H; Itoh KM
Nanotechnology; 2018 Jul; 29(28):28LT01. PubMed ID: 29697051
[TBL] [Abstract][Full Text] [Related]
34. Durable diamond-like carbon templates for UV nanoimprint lithography.
Tao L; Ramachandran S; Nelson CT; Lin M; Overzet LJ; Goeckner M; Lee G; Willson CG; Wu W; Hu W
Nanotechnology; 2008 Mar; 19(10):105302. PubMed ID: 21817695
[TBL] [Abstract][Full Text] [Related]
35. Selection of di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography.
Nakagawa M; Kobayashi K; Hattori AN; Ito S; Hiroshiba N; Kubo S; Tanaka H
Langmuir; 2015 Apr; 31(14):4188-95. PubMed ID: 25793911
[TBL] [Abstract][Full Text] [Related]
36. Low-cost, durable master molds for thermal-NIL, UV-NIL, and injection molding.
Dundar Arisoy F; Czolkos I; Johansson A; Nielsen T; Watkins JJ
Nanotechnology; 2020 Jan; 31(1):015302. PubMed ID: 31530757
[TBL] [Abstract][Full Text] [Related]
37. Single Layer Lift-Off of CSAR62 for Dense Nanostructured Patterns.
Ohlin H; Frisk T; Vogt U
Micromachines (Basel); 2023 Mar; 14(4):. PubMed ID: 37420999
[TBL] [Abstract][Full Text] [Related]
38. Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography.
Haslinger MJ; Maier OS; Pribyl M; Taus P; Kopp S; Wanzenboeck HD; Hingerl K; Muehlberger MM; Guillén E
Nanomaterials (Basel); 2023 May; 13(9):. PubMed ID: 37177101
[TBL] [Abstract][Full Text] [Related]
39. Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting.
Ahn SH; Guo LJ
ACS Nano; 2009 Aug; 3(8):2304-10. PubMed ID: 19702323
[TBL] [Abstract][Full Text] [Related]
40. Interfacial Contact is Required for Metal-Assisted Plasma Etching of Silicon.
Sun JB; Almquist BD
Adv Mater Interfaces; 2018 Dec; 5(24):1800836. PubMed ID: 30613462
[TBL] [Abstract][Full Text] [Related]
[Previous] [Next] [New Search]