These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

132 related articles for article (PubMed ID: 38050711)

  • 1. A novel atomic removal model for chemical mechanical polishing using developed mesoporous shell/core abrasives based on molecular dynamics.
    Liu Z; Zhang Z; Feng J; Yi X; Shi C; Gu Y; Zhao F; Liu S; Li J
    Nanoscale; 2023 Dec; 16(1):85-96. PubMed ID: 38050711
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Atomic surface of quartz glass induced by photocatalytic green chemical mechanical polishing using the developed SiO
    Fan Y; Zhang Z; Yu J; Deng X; Shi C; Zhou H; Meng F; Feng J
    Nanoscale Adv; 2024 Feb; 6(5):1380-1391. PubMed ID: 38419872
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Atomic surface achieved through a novel cross-scale model from macroscale to nanoscale.
    Zhao F; Zhang Z; Deng X; Feng J; Zhou H; Liu Z; Meng F; Shi C
    Nanoscale; 2024 Feb; 16(5):2318-2336. PubMed ID: 38175155
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Polishing Performance and Removal Mechanism of Core-Shell Structured Diamond/SiO
    Zhao G; Xu Y; Wang Q; Liu J; Zhan Y; Chen B
    Micromachines (Basel); 2022 Dec; 13(12):. PubMed ID: 36557459
    [TBL] [Abstract][Full Text] [Related]  

  • 5. The Effects of Precursors on the Morphology and Chemical Mechanical Polishing Performance of Ceria-Based Abrasives.
    Zheng Y; Wang N; Feng Z; Tan X; Zhang Z; Han H; Huang X
    Materials (Basel); 2022 Oct; 15(21):. PubMed ID: 36363118
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Preparation of Fe-doped colloidal SiO(2) abrasives and their chemical mechanical polishing behavior on sapphire substrates.
    Lei H; Gu Q; Chen R; Wang Z
    Appl Opt; 2015 Aug; 54(24):7188-94. PubMed ID: 26368752
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Silicon Wafer CMP Slurry Using a Hydrolysis Reaction Accelerator with an Amine Functional Group Remarkably Enhances Polishing Rate.
    Bae JY; Han MH; Lee SJ; Kim ES; Lee K; Lee GS; Park JH; Park JG
    Nanomaterials (Basel); 2022 Nov; 12(21):. PubMed ID: 36364668
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Atomistic Removal Mechanisms of SiC in Hydrogen Peroxide Solution.
    Man Q; Sun Q; Wang Y; Xu J
    Micromachines (Basel); 2024 Jun; 15(6):. PubMed ID: 38930724
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Green chemical mechanical polishing of sapphire wafers using a novel slurry.
    Xie W; Zhang Z; Liao L; Liu J; Su H; Wang S; Guo D
    Nanoscale; 2020 Nov; 12(44):22518-22526. PubMed ID: 32996521
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Atomic-Level Material Removal Mechanisms of Si(110) Chemical Mechanical Polishing: Insights from ReaxFF Reactive Molecular Dynamics Simulations.
    Wang M; Duan F
    Langmuir; 2021 Feb; 37(6):2161-2169. PubMed ID: 33530684
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Insight into Polishing Slurry and Material Removal Mechanism of Photoassisted Chemical Mechanical Polishing of YAG Crystals.
    Zhang X; Guo X; Wang H; Kang R; Gao S
    Langmuir; 2023 Sep; 39(38):13668-13677. PubMed ID: 37699563
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Unprecedented atomic surface of silicon induced by environmentally friendly chemical mechanical polishing.
    Cui X; Zhang Z; Yu S; Chen X; Shi C; Zhou H; Meng F; Yu J; Wen W
    Nanoscale; 2023 Jun; 15(21):9304-9314. PubMed ID: 37171082
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Polymer Nanoparticles Applied in the CMP (Chemical Mechanical Polishing) Process of Chip Wafers for Defect Improvement and Polishing Removal Rate Response.
    Chiu WL; Huang CI
    Polymers (Basel); 2023 Jul; 15(15):. PubMed ID: 37571091
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Tribochemical mechanisms of abrasives for SiC and sapphire substrates in nanoscale polishing.
    Luo Q; Lu J; Jiang F; Lin J; Tian Z
    Nanoscale; 2023 Oct; 15(38):15675-15685. PubMed ID: 37724457
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Mechanism Exploration of the Effect of Polyamines on the Polishing Rate of Silicon Chemical Mechanical Polishing: A Study Combining Simulations and Experiments.
    Lin Z; Zhu J; Huang Q; Zhu L; Li W; Yu W
    Nanomaterials (Basel); 2024 Jan; 14(1):. PubMed ID: 38202582
    [TBL] [Abstract][Full Text] [Related]  

  • 16. New Atomistic Insights on the Chemical Mechanical Polishing of Silica Glass with Ceria Nanoparticles.
    Brugnoli L; Miyatani K; Akaji M; Urata S; Pedone A
    Langmuir; 2023 Apr; 39(15):5527-5541. PubMed ID: 37029752
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Synthesis and performance of colloidal silica nano-abrasives with controllable size for chemical mechanical planarization.
    Zhang KL; Song ZT; Wang F; Wang LY; Feng SL
    J Nanosci Nanotechnol; 2009 Feb; 9(2):1054-7. PubMed ID: 19441454
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Super fine cerium hydroxide abrasives for SiO
    Son YH; Jeong GP; Kim PS; Han MH; Hong SW; Bae JY; Kim SI; Park JH; Park JG
    Sci Rep; 2021 Sep; 11(1):17736. PubMed ID: 34489499
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Development of a Novel Water Jet Polisher Using Soft Abrasives for Small Complex-Structure Heat Pipes of Aluminum Alloy Produced Using Additive Manufacturing.
    Zhang T; Zhang Z; Feng J; Shi C; Zhou H; Meng F; Tong D
    Materials (Basel); 2024 Jan; 17(3):. PubMed ID: 38591422
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Characterization of Ceria Nanoparticles as Abrasives Applied with Defoaming Polymers for CMP (Chemical Mechanical Polishing) Applications.
    Hwang S; Kim W
    Polymers (Basel); 2024 Mar; 16(6):. PubMed ID: 38543450
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 7.