130 related articles for article (PubMed ID: 38185791)
1. Helium Ion-Assisted Wet Etching of Silicon Carbide with Extremely Low Roughness for High-Quality Nanofabrication.
Wen X; Zhang L; Wang X; Chen L; Sun J; Hu H
Small Methods; 2024 May; 8(5):e2301364. PubMed ID: 38185791
[TBL] [Abstract][Full Text] [Related]
2. Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching.
Wen X; Zhang L; Tian F; Xu Y; Hu H
Nanomaterials (Basel); 2022 Sep; 12(19):. PubMed ID: 36234396
[TBL] [Abstract][Full Text] [Related]
3. Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures.
Petrov YV; Grigoryev EA; Baraban AP
Nanotechnology; 2020 May; 31(21):215301. PubMed ID: 31978916
[TBL] [Abstract][Full Text] [Related]
4. Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers.
Hochreiter A; Groß F; Möller MN; Krieger M; Weber HB
Sci Rep; 2023 Nov; 13(1):19086. PubMed ID: 37925526
[TBL] [Abstract][Full Text] [Related]
5. Neon and helium focused ion beam etching of resist patterns.
Xia D; Zhu X; Khanom F; Runt D
Nanotechnology; 2020 Nov; 31(47):475301. PubMed ID: 32886649
[TBL] [Abstract][Full Text] [Related]
6. Hybrid Anodic and Metal-Assisted Chemical Etching Method Enabling Fabrication of Silicon Carbide Nanowires.
Chen Y; Zhang C; Li L; Zhou S; Chen X; Gao J; Zhao N; Wong CP
Small; 2019 Feb; 15(7):e1803898. PubMed ID: 30667586
[TBL] [Abstract][Full Text] [Related]
7. Nano-structuring, surface and bulk modification with a focused helium ion beam.
Fox D; Chen Y; Faulkner CC; Zhang H
Beilstein J Nanotechnol; 2012; 3():579-85. PubMed ID: 23019554
[TBL] [Abstract][Full Text] [Related]
8. Selective etching of focused gallium ion beam implanted regions from silicon as a nanofabrication method.
Han Z; Vehkamäki M; Mattinen M; Salmi E; Mizohata K; Leskelä M; Ritala M
Nanotechnology; 2015 Jul; 26(26):265304. PubMed ID: 26062985
[TBL] [Abstract][Full Text] [Related]
9. Ultra-Smooth Polishing of Single-Crystal Silicon Carbide by Pulsed-Ion-Beam Sputtering of Quantum-Dot Sacrificial Layers.
Qiao D; Shi F; Tian Y; Zhang W; Xie L; Guo S; Song C; Tie G
Materials (Basel); 2023 Dec; 17(1):. PubMed ID: 38204011
[TBL] [Abstract][Full Text] [Related]
10. Defect Localization and Nanofabrication for Conductive Structures with Voltage Contrast in Helium Ion Microscopy.
Xia D; McVey S; Huynh C; Kuehn W
ACS Appl Mater Interfaces; 2019 Feb; 11(5):5509-5516. PubMed ID: 30644713
[TBL] [Abstract][Full Text] [Related]
11. Wet-Oxidation-Assisted Chemical Mechanical Polishing and High-Temperature Thermal Annealing for Low-Loss 4H-SiC Integrated Photonic Devices.
Shi X; Lu Y; Chaussende D; Rottwitt K; Ou H
Materials (Basel); 2023 Mar; 16(6):. PubMed ID: 36984202
[TBL] [Abstract][Full Text] [Related]
12. Anisotropic Charge Transport Enabling High-Throughput and High-Aspect-Ratio Wet Etching of Silicon Carbide.
Shi D; Chen Y; Li Z; Dong S; Li L; Hou M; Liu H; Zhao S; Chen X; Wong CP; Zhao N
Small Methods; 2022 Aug; 6(8):e2200329. PubMed ID: 35616183
[TBL] [Abstract][Full Text] [Related]
13. Fabrication of Homogeneous Nanoporous Structure on 4H-/6H-SiC Wafer Surface via Efficient and Eco-Friendly Electrolytic Plasma-Assisted Chemical Etching.
Zhan S; Liu B; Yu X; Chen X; Zeng G; Zhao Y
Small; 2023 Apr; 19(14):e2205720. PubMed ID: 36634983
[TBL] [Abstract][Full Text] [Related]
14. A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide.
Racka-Szmidt K; Stonio B; Żelazko J; Filipiak M; Sochacki M
Materials (Basel); 2021 Dec; 15(1):. PubMed ID: 35009277
[TBL] [Abstract][Full Text] [Related]
15. Direct visualization of beam-resist interaction volume for sub-nanometer helium ion beam-lithography.
Deng Y; Zhuang X; Wang W; Gu R; He D; Wang L; Cheng X
Nanotechnology; 2021 Jul; 32(41):. PubMed ID: 34198269
[TBL] [Abstract][Full Text] [Related]
16. A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope.
Allen FI
Beilstein J Nanotechnol; 2021; 12():633-664. PubMed ID: 34285866
[TBL] [Abstract][Full Text] [Related]
17. Etching of graphene devices with a helium ion beam.
Lemme MC; Bell DC; Williams JR; Stern LA; Baugher BW; Jarillo-Herrero P; Marcus CM
ACS Nano; 2009 Sep; 3(9):2674-6. PubMed ID: 19769403
[TBL] [Abstract][Full Text] [Related]
18. Proof of principle of helium-beam radiography using silicon pixel detectors for energy deposition measurement, identification, and tracking of single ions.
Gehrke T; Gallas R; Jäkel O; Martišíková M
Med Phys; 2018 Feb; 45(2):817-829. PubMed ID: 29235123
[TBL] [Abstract][Full Text] [Related]
19. Direct-write three-dimensional nanofabrication of nanopyramids and nanocones on Si by nanotumefaction using a helium ion microscope.
Zhang L; Heinig NF; Bazargan S; Abd-Ellah M; Moghimi N; Leung KT
Nanotechnology; 2015 Jan; 26(25):255303. PubMed ID: 26040204
[TBL] [Abstract][Full Text] [Related]
20. Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal-Organic Resist and Helium Ion Beam Lithography.
Lewis SM; Hunt MS; DeRose GA; Alty HR; Li J; Wertheim A; De Rose L; Timco GA; Scherer A; Yeates SG; Winpenny REP
Nano Lett; 2019 Sep; 19(9):6043-6048. PubMed ID: 31424217
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]