These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
134 related articles for article (PubMed ID: 38213573)
1. TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes. Williams J; Faley MI; Vas JV; Lu PH; Dunin-Borkowski RE Beilstein J Nanotechnol; 2024; 15():1-12. PubMed ID: 38213573 [TBL] [Abstract][Full Text] [Related]
2. Effect of using stencil masks made by focused ion beam milling on permalloy (Ni81Fe19) nanostructures. Bates JR; Miyahara Y; Burgess JA; Iglesias-Freire O; Grütter P Nanotechnology; 2013 Mar; 24(11):115301. PubMed ID: 23449320 [TBL] [Abstract][Full Text] [Related]
3. Fabrication of Magnetic Nanostructures on Silicon Nitride Membranes for Magnetic Vortex Studies Using Transmission Microscopy Techniques. Dhankhar M; Vaňatka M; Urbanek M J Vis Exp; 2018 Jul; (137):. PubMed ID: 30010671 [TBL] [Abstract][Full Text] [Related]
4. Phase masks for electron microscopy fabricated by thermal scanning probe lithography. Hettler S; Radtke L; Grünewald L; Lisunova Y; Peric O; Brugger J; Bonanni S Micron; 2019 Dec; 127():102753. PubMed ID: 31586831 [TBL] [Abstract][Full Text] [Related]
5. Quantitative imaging of the magnetic configuration of modulated nanostructures by electron holography. Körner M; Röder F; Lenz K; Fritzsche M; Lindner J; Lichte H; Fassbender J Small; 2014 Dec; 10(24):5161-9. PubMed ID: 25066641 [TBL] [Abstract][Full Text] [Related]
7. Fabrication of phase masks from amorphous carbon thin films for electron-beam shaping. Grünewald L; Gerthsen D; Hettler S Beilstein J Nanotechnol; 2019; 10():1290-1302. PubMed ID: 31293866 [No Abstract] [Full Text] [Related]
8. Fabrication of plasmonic structures with well-controlled nanometric features: a comparison between lift-off and ion beam etching. Abasahl B; Santschi C; Raziman TV; Martin OJF Nanotechnology; 2021 Aug; 32(47):. PubMed ID: 34348240 [TBL] [Abstract][Full Text] [Related]
9. Ga(+) beam lithography for nanoscale silicon reactive ion etching. Henry MD; Shearn MJ; Chhim B; Scherer A Nanotechnology; 2010 Jun; 21(24):245303. PubMed ID: 20484788 [TBL] [Abstract][Full Text] [Related]
10. Optimization of e-beam lithography parameters for nanofabrication of sub-50 nm gold nanowires and nanogaps based on a bilayer lift-off process. Sahin O; Albayrak OM; Yapici MK Nanotechnology; 2024 Jul; 35(39):. PubMed ID: 38959870 [TBL] [Abstract][Full Text] [Related]
11. Focused ion beam fabrication of spintronic nanostructures: an optimization of the milling process. Urbánek M; Uhlír V; Bábor P; Kolíbalová E; Hrncír T; Spousta J; Sikola T Nanotechnology; 2010 Apr; 21(14):145304. PubMed ID: 20215654 [TBL] [Abstract][Full Text] [Related]
12. In situ TEM observation of magnetic materials. Tanase M; Petford-Long AK Microsc Res Tech; 2009 Mar; 72(3):187-96. PubMed ID: 19165741 [TBL] [Abstract][Full Text] [Related]
13. Magnetic characterization of cobalt nanowires and square nanorings fabricated by focused electron beam induced deposition. Venturi F; Gazzadi GC; Tavabi AH; Rota A; Dunin-Borkowski RE; Frabboni S Beilstein J Nanotechnol; 2018; 9():1040-1049. PubMed ID: 29719756 [TBL] [Abstract][Full Text] [Related]
14. Transmission electron microscopy on thin film of high density magnetic composite prepared by FIB method. Kobayashi Y; Park YG; Shindo D; Tajima S J Electron Microsc (Tokyo); 2004; 53(5):485-7. PubMed ID: 15582951 [TBL] [Abstract][Full Text] [Related]
15. Wet-chemical etching of FIB lift-out TEM lamellae for damage-free analysis of 3-D nanostructures. Turner EM; Sapkota KR; Hatem C; Lu P; Wang GT; Jones KS Ultramicroscopy; 2020 Sep; 216():113049. PubMed ID: 32593126 [TBL] [Abstract][Full Text] [Related]
16. Nanofabrication by advanced electron microscopy using intense and focused beam Furuya K Sci Technol Adv Mater; 2008 Jan; 9(1):014110. PubMed ID: 27877936 [TBL] [Abstract][Full Text] [Related]