These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

113 related articles for article (PubMed ID: 38251172)

  • 21. Highly selective etching of SiN
    Yoo SJ; Kang JE; Ji YJ; Tak HW; Cho BO; Kim YL; Lee KC; Chun JS; Kim Y; Kim DW; Yeom GY
    Nanotechnology; 2023 Aug; 34(46):. PubMed ID: 37531942
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Thermal Atomic Layer Etching of SiO
    DuMont JW; Marquardt AE; Cano AM; George SM
    ACS Appl Mater Interfaces; 2017 Mar; 9(11):10296-10307. PubMed ID: 28240864
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Effect of Mask Geometry Variation on Plasma Etching Profiles.
    Bobinac J; Reiter T; Piso J; Klemenschits X; Baumgartner O; Stanojevic Z; Strof G; Karner M; Filipovic L
    Micromachines (Basel); 2023 Mar; 14(3):. PubMed ID: 36985072
    [TBL] [Abstract][Full Text] [Related]  

  • 24. OES diagnostics as a universal technique to control the Si etching structures profile in ICP.
    Osipov AA; Iankevich GA; Speshilova AB; Gagaeva AE; Osipov AA; Enns YB; Kazakin AN; Endiiarova EV; Belyanov IA; Ivanov VI; Alexandrov SE
    Sci Rep; 2022 Mar; 12(1):5287. PubMed ID: 35347199
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Plasma Parameters and Etching Characteristics of SiO
    Nam Y; Efremov A; Lee BJ; Kwon KH
    Materials (Basel); 2020 Dec; 13(23):. PubMed ID: 33271912
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Effect of the chamber wall on fluorocarbon-assisted atomic layer etching of SiO
    Kawakami M; Metzler D; Li C; Oehrlein GS
    J Vac Sci Technol A; 2016 Jul; 34(4):040603. PubMed ID: 27375342
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Reduction of EUV resist damage by neutral beam etching.
    Kim GW; Chang WJ; Kang JE; Kim HJ; Yeom GY
    Nanotechnology; 2021 Dec; 33(9):. PubMed ID: 34808609
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Characterization of SiO
    Cho C; You K; Kim S; Lee Y; Lee J; You S
    Materials (Basel); 2021 Sep; 14(17):. PubMed ID: 34501123
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Effect of Embedded RF Pulsing for Selective Etching of SiO2 in the Dual-Frequency Capacitive Coupled Plasmas.
    Kim NH; Jeon MH; Kim TH; Yeom GY
    J Nanosci Nanotechnol; 2015 Nov; 15(11):8667-73. PubMed ID: 26726572
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers.
    Pound-Lana G; Bézard P; Petit-Etienne C; Cavalaglio S; Cunge G; Cabannes-Boué B; Fleury G; Chevalier X; Zelsmann M
    ACS Appl Mater Interfaces; 2021 Oct; 13(41):49184-49193. PubMed ID: 34636239
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Characterization of SiO
    Choi M; Lee Y; You Y; Cho C; Jeong W; Seong I; Choi B; Kim S; Seol Y; You S; Yeom GY
    Materials (Basel); 2023 Aug; 16(16):. PubMed ID: 37629915
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Etch Characteristics of Nanoscale Patterned Magnetic Tunnel Junction Stacks Using Pulse-Modulated Radio Frequency Source Plasma.
    Lee JY; Lim ET; Ryu JS; Choi JS; Chung CW
    J Nanosci Nanotechnol; 2020 Aug; 20(8):5131-5137. PubMed ID: 32126711
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Ga(+) beam lithography for nanoscale silicon reactive ion etching.
    Henry MD; Shearn MJ; Chhim B; Scherer A
    Nanotechnology; 2010 Jun; 21(24):245303. PubMed ID: 20484788
    [TBL] [Abstract][Full Text] [Related]  

  • 34. Low damage atomic layer etching of ZrO2 by using BCl3 gas and ar neutral beam.
    Lim WS; Park JB; Park JY; Park BJ; Yeom GY
    J Nanosci Nanotechnol; 2009 Dec; 9(12):7379-82. PubMed ID: 19908792
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Pulse-Modulated Plasma Etching of Copper Thin Films via CH₃COOH/Ar.
    Ryu JS; Lim ET; Cha MH; Chung CW
    J Nanosci Nanotechnol; 2021 Nov; 21(11):5628-5634. PubMed ID: 33980372
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO
    Lee Y; Kim S; Lee J; Cho C; Seong I; You S
    Sensors (Basel); 2022 Aug; 22(16):. PubMed ID: 36015787
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Mechanism understanding in cryo atomic layer etching of SiO
    Antoun G; Tillocher T; Lefaucheux P; Faguet J; Maekawa K; Dussart R
    Sci Rep; 2021 Jan; 11(1):357. PubMed ID: 33431975
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching.
    Shi Z; Jefimovs K; Romano L; Stampanoni M
    Micromachines (Basel); 2020 Sep; 11(9):. PubMed ID: 32961900
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Method for Keyhole-Free High-Aspect-Ratio Trench Refill by LPCVD.
    Veltkamp HW; Janssens YL; de Boer MJ; Zhao Y; Wiegerink RJ; Tas NR; Lötters JC
    Micromachines (Basel); 2022 Nov; 13(11):. PubMed ID: 36363929
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF
    Ghezzi F; Pedroni M; Kovač J; Causa F; Cremona A; Anderle M; Caniello R; Pietralunga SM; Vassallo E
    ACS Omega; 2022 Jul; 7(29):25600-25612. PubMed ID: 35910127
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 6.