119 related articles for article (PubMed ID: 38297748)
1. Edge smoothing optimization method in DMD digital lithography system based on dynamic blur matching pixel overlap technique.
Huang S; Ren B; Tang Y; Wu D; Pan J; Tian Z; Jiang C; Li Z; Huang J
Opt Express; 2024 Jan; 32(2):2114-2123. PubMed ID: 38297748
[TBL] [Abstract][Full Text] [Related]
2. Edge smoothness enhancement in DMD scanning lithography system based on a wobulation technique.
Chen R; Liu H; Zhang H; Zhang W; Xu J; Xu W; Li J
Opt Express; 2017 Sep; 25(18):21958-21968. PubMed ID: 29041486
[TBL] [Abstract][Full Text] [Related]
3. Lithographic pattern quality enhancement of DMD lithography with spatiotemporal modulated technology.
Guo S; Lu Z; Xiong Z; Huang L; Liu H; Li J
Opt Lett; 2021 Mar; 46(6):1377-1380. PubMed ID: 33720191
[TBL] [Abstract][Full Text] [Related]
4. Genetic algorithm-based optical proximity correction for DMD maskless lithography.
Yang Z; Lin J; Liu L; Zhu Z; Zhang R; Wen S; Yin Y; Lan C; Li C; Liu Y
Opt Express; 2023 Jul; 31(14):23598-23607. PubMed ID: 37475440
[TBL] [Abstract][Full Text] [Related]
5. Optical proximity correction of hot-spot patterns with subwavelength size in DMD maskless projection lithography.
Guo X; Chen JT; Zhao YY; Cai SC; Duan XM
Opt Lett; 2024 Feb; 49(4):810-813. PubMed ID: 38359188
[TBL] [Abstract][Full Text] [Related]
6. Method for improving the speed and pattern quality of a DMD maskless lithography system using a pulse exposure method.
Choi J; Kim G; Lee WS; Chang WS; Yoo H
Opt Express; 2022 Jun; 30(13):22487-22500. PubMed ID: 36224945
[TBL] [Abstract][Full Text] [Related]
7. Intensity modulation based optical proximity optimization for the maskless lithography.
Liu J; Liu J; Deng Q; Feng J; Zhou S; Hu S
Opt Express; 2020 Jan; 28(1):548-557. PubMed ID: 32118980
[TBL] [Abstract][Full Text] [Related]
8. Accurate pixel-to-pixel correspondence adjustment in a digital micromirror device camera by using the phase-shifting moiré method.
Ri S; Fujigaki M; Matui T; Morimoto Y
Appl Opt; 2006 Sep; 45(27):6940-6. PubMed ID: 16946769
[TBL] [Abstract][Full Text] [Related]
9. Edge-Based Defocus Blur Estimation With Adaptive Scale Selection.
Karaali A; Jung CR
IEEE Trans Image Process; 2018 Mar; 27(3):1126-1137. PubMed ID: 29220316
[TBL] [Abstract][Full Text] [Related]
10. Robust hybrid source and mask optimization to lithography source blur and flare.
Han C; Li Y; Ma X; Liu L
Appl Opt; 2015 Jun; 54(17):5291-302. PubMed ID: 26192826
[TBL] [Abstract][Full Text] [Related]
11. Measurement and compensation of a stitching error in a DMD-based step-stitching photolithography system.
Zhou S; Lu Z; Yuan Q; Wu G; Liu C; Liu H
Appl Opt; 2021 Oct; 60(29):9074-9081. PubMed ID: 34623988
[TBL] [Abstract][Full Text] [Related]
12. Anti-scattering light focusing by fast wavefront shaping based on multi-pixel encoded digital-micromirror device.
Yang J; He Q; Liu L; Qu Y; Shao R; Song B; Zhao Y
Light Sci Appl; 2021 Jul; 10(1):149. PubMed ID: 34285183
[TBL] [Abstract][Full Text] [Related]
13. Block-based mask optimization for optical lithography.
Ma X; Song Z; Li Y; Arce GR
Appl Opt; 2013 May; 52(14):3351-63. PubMed ID: 23669851
[TBL] [Abstract][Full Text] [Related]
14. Edge-preserving smoothing filter using fast M-estimation method with an automatic determination algorithm for basic width.
Yamaguchi Y; Yoshida I; Kondo Y; Numada M; Koshimizu H; Oshiro K; Saito R
Sci Rep; 2023 Apr; 13(1):5477. PubMed ID: 37016031
[TBL] [Abstract][Full Text] [Related]
15. Unified blind method for multi-image super-resolution and single/multi-image blur deconvolution.
Faramarzi E; Rajan D; Christensen MP
IEEE Trans Image Process; 2013 Jun; 22(6):2101-14. PubMed ID: 23314775
[TBL] [Abstract][Full Text] [Related]
16. Real-time matching strategy for rotary objects using digital image correlation.
Yang D; Su Z; Zhang S; Zhang D
Appl Opt; 2020 Aug; 59(22):6648-6657. PubMed ID: 32749368
[TBL] [Abstract][Full Text] [Related]
17. Image edge smoothing method for light-field displays based on joint design of optical structure and elemental images.
Yu X; Li H; Su X; Gao X; Sang X; Yan B
Opt Express; 2023 May; 31(11):18017-18025. PubMed ID: 37381520
[TBL] [Abstract][Full Text] [Related]
18. High-fidelity source mask optimization for suppressing line-end shortening.
Zhang Z; Yuan M; Li Z; Huang W; Yang H; Li Z; Li Y
Appl Opt; 2024 Jan; 63(2):327-337. PubMed ID: 38227225
[TBL] [Abstract][Full Text] [Related]
19. Fast inverse lithography approach based on a model-driven graph convolutional network.
Zhang S; Ma X; Zhang J
Opt Express; 2023 Oct; 31(22):36451-36467. PubMed ID: 38017798
[TBL] [Abstract][Full Text] [Related]
20. Discovery, Quantitative Recurrence, and Inhibition of Motion-Blur Hysteresis Phenomenon in Visual Tracking Displacement Detection.
Shi L; Tan J
Sensors (Basel); 2023 Sep; 23(19):. PubMed ID: 37836856
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
