These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

116 related articles for article (PubMed ID: 38330452)

  • 1. Wet cleaning of Ta-based extreme ultraviolet photomasks at room temperature.
    Park J; Choi W; Kim J
    Nanotechnology; 2024 Feb; 35(20):. PubMed ID: 38330452
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Transverse Deflection for Extreme Ultraviolet Pellicles.
    Kim SK
    Materials (Basel); 2023 Apr; 16(9):. PubMed ID: 37176352
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Study on ZrSi
    Wi SJ; Kim WJ; Kim H; Jeong D; Lee DG; Choi J; Cho SJ; Yu L; Ahn J
    Membranes (Basel); 2023 Aug; 13(8):. PubMed ID: 37623792
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Physico-Chemical Surface Modifications of Polyetheretherketone (PEEK) Using Extreme Ultraviolet (EUV) Radiation and EUV-Induced Nitrogen Plasma.
    Czwartos J; Budner B; Bartnik A; Wachulak P; Fiedorowicz H; Mierczyk Z
    Materials (Basel); 2020 Oct; 13(19):. PubMed ID: 33050110
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Effect of Extreme Ultraviolet (EUV) Radiation and EUV Induced, N
    Czwartos J; Budner B; Bartnik A; Wachulak P; Butruk-Raszeja BA; Lech A; Ciach T; Fiedorowicz H
    Int J Mol Sci; 2021 Aug; 22(16):. PubMed ID: 34445159
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Resistless EUV lithography: Photon-induced oxide patterning on silicon.
    Tseng LT; Karadan P; Kazazis D; Constantinou PC; Stock TJZ; Curson NJ; Schofield SR; Muntwiler M; Aeppli G; Ekinci Y
    Sci Adv; 2023 Apr; 9(16):eadf5997. PubMed ID: 37075116
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Line-Edge Roughness Stochastics for 5-nm Pattern Formation in the Extreme Ultraviolet Lithography.
    Kim SK
    J Nanosci Nanotechnol; 2019 Aug; 19(8):4657-4660. PubMed ID: 30913764
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Beyond EUV lithography: a comparative study of efficient photoresists' performance.
    Mojarad N; Gobrecht J; Ekinci Y
    Sci Rep; 2015 Mar; 5():9235. PubMed ID: 25783209
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Actinic microscope for extreme ultraviolet lithography photomask inspection and review.
    Goldstein M; Naulleau P
    Opt Express; 2012 Jul; 20(14):15752-68. PubMed ID: 22772266
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Characterisation of engineered defects in extreme ultraviolet mirror substrates using lab-scale extreme ultraviolet reflection ptychography.
    Lu H; Odstrčil M; Pooley C; Biller J; Mebonia M; He G; Praeger M; Juschkin L; Frey J; Brocklesby W
    Ultramicroscopy; 2023 Jul; 249():113720. PubMed ID: 37004492
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Determination of optical constants of thin films in the EUV.
    Ciesielski R; Saadeh Q; Philipsen V; Opsomer K; Soulié JP; Wu M; Naujok P; van de Kruijs RWE; Detavernier C; Kolbe M; Scholze F; Soltwisch V
    Appl Opt; 2022 Mar; 61(8):2060-2078. PubMed ID: 35297898
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Large-scale freestanding nanometer-thick graphite pellicles for mass production of nanodevices beyond 10 nm.
    Kim SG; Shin DW; Kim T; Kim S; Lee JH; Lee CG; Yang CW; Lee S; Cho SJ; Jeon HC; Kim MJ; Kim BG; Yoo JB
    Nanoscale; 2015 Sep; 7(35):14608-11. PubMed ID: 26159369
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Development of a dynamic gas lock inhibited model for EUV-induced carbon deposition.
    Hao M; Teng S; Liu J; Xie Y; Ba D; Bian X; Ba Y; Chen Z; Liu K
    J Chem Phys; 2024 Jan; 160(4):. PubMed ID: 38284653
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning.
    Ashby PD; Olynick DL; Ogletree DF; Naulleau PP
    Adv Mater; 2015 Oct; 27(38):5813-9. PubMed ID: 26079187
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Absolute intensity calibration of flat-field space-resolved extreme ultraviolet spectrometer using radial profiles of visible and extreme ultraviolet bremsstrahlung continuum emitted from high-density plasmas in Large Helical Device.
    Dong C; Morita S; Goto M; Wang E
    Rev Sci Instrum; 2011 Nov; 82(11):113102. PubMed ID: 22128961
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond.
    Mojarad N; Hojeij M; Wang L; Gobrecht J; Ekinci Y
    Nanoscale; 2015 Mar; 7(9):4031-7. PubMed ID: 25653148
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Refined extreme ultraviolet mask stack model.
    Makhotkin IA; Wu M; Soltwisch V; Scholze F; Philipsen V
    J Opt Soc Am A Opt Image Sci Vis; 2021 Apr; 38(4):498-503. PubMed ID: 33798178
    [TBL] [Abstract][Full Text] [Related]  

  • 18. EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning.
    Constantinou P; Stock TJZ; Tseng LT; Kazazis D; Muntwiler M; Vaz CAF; Ekinci Y; Aeppli G; Curson NJ; Schofield SR
    Nat Commun; 2024 Jan; 15(1):694. PubMed ID: 38267459
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Corrective finishing of extreme ultraviolet photomask blanks by precessed bonnet polisher.
    Beaucamp A; Namba Y; Charlton P
    Appl Opt; 2014 May; 53(14):3075-80. PubMed ID: 24922029
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Understanding the Exposure Process in the Extreme Ultra Violet Lithography.
    Kim SK
    J Nanosci Nanotechnol; 2021 Aug; 21(8):4466-4469. PubMed ID: 33714346
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 6.