These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
112 related articles for article (PubMed ID: 38568648)
21. The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography. Wu J; Geng Z; Xie Y; Fan Z; Su Y; Xu C; Chen H Nanomaterials (Basel); 2019 Jan; 9(1):. PubMed ID: 30621058 [TBL] [Abstract][Full Text] [Related]
22. A new type of nanoscale reference grating manufactured by combined laser-focused atomic deposition and x-ray interference lithography and its use for calibrating a scanning electron microscope. Deng X; Dai G; Liu J; Hu X; Bergmann D; Zhao J; Tai R; Cai X; Li Y; Li T; Cheng X Ultramicroscopy; 2021 Jul; 226():113293. PubMed ID: 33993000 [TBL] [Abstract][Full Text] [Related]
23. Design of a binary metal micron grating and its application in near-infrared hot-electron photodetectors. Hu XL; Li F; Xu SH; Liu WJ Opt Lett; 2023 Aug; 48(15):4033-4036. PubMed ID: 37527111 [TBL] [Abstract][Full Text] [Related]
24. Rectangular multilayer dielectric gratings with broadband high diffraction efficiency and enhanced laser damage resistance. Xie L; Zhang J; Zhang Z; Ma B; Li T; Wang Z; Cheng X Opt Express; 2021 Jan; 29(2):2669-2678. PubMed ID: 33726458 [TBL] [Abstract][Full Text] [Related]
25. Fabrication of ultra-high aspect ratio silicon grating using an alignment method based on a scanning beam interference lithography system. Chen X; Jiang S; Li Y; Jiang Y; Wang W; Bayanheshig Opt Express; 2022 Oct; 30(22):40842-40853. PubMed ID: 36299010 [TBL] [Abstract][Full Text] [Related]
26. Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference. Sreekanth KV; Chua JK; Murukeshan VM Appl Opt; 2010 Dec; 49(35):6710-7. PubMed ID: 21151227 [TBL] [Abstract][Full Text] [Related]
27. Polarized holographic lithography system for high-uniformity microscale patterning with periodic tunability. Xue G; Zhai Q; Lu H; Zhou Q; Ni K; Lin L; Wang X; Li X Microsyst Nanoeng; 2021; 7():31. PubMed ID: 34567745 [TBL] [Abstract][Full Text] [Related]
28. Accurate measurement and adjustment method for interference fringe direction in a scanning beam interference lithography system. Li Y; Jiang S; Chen X; Liu Z; Wang W; Song Y; Bayanheshig Opt Express; 2023 Aug; 31(17):28145-28160. PubMed ID: 37710876 [TBL] [Abstract][Full Text] [Related]
29. Fabrication of high-resolution large-area patterns using EUV interference lithography in a scan-exposure mode. Wang L; Solak HH; Ekinci Y Nanotechnology; 2012 Aug; 23(30):305303. PubMed ID: 22781087 [TBL] [Abstract][Full Text] [Related]
30. Fiber-based flexible interference lithography for photonic nanopatterning. He J; Lin Y; Zhang X Opt Express; 2014 Oct; 22(21):26386-91. PubMed ID: 25401671 [TBL] [Abstract][Full Text] [Related]
31. Simulation analysis of high-order high-duty-cycle surface gratings. Tian K; Zou Y; Shi L; Zhang H; Xu Y; Fan J; Tang H; Ma X Appl Opt; 2022 Sep; 61(27):8147-8154. PubMed ID: 36255938 [TBL] [Abstract][Full Text] [Related]
33. Performance of Grating Couplers Used in the Optical Switch Configuration. Laffont E; Valour A; Crespo-Monteiro N; Berini P; Jourlin Y Sensors (Basel); 2023 Nov; 23(22):. PubMed ID: 38005416 [TBL] [Abstract][Full Text] [Related]
34. Holographic fabrication of an arrayed one-axis scale grating for a two-probe optical linear encoder. Li X; Zhou Q; Zhu X; Lu H; Yang L; Ma D; Sun J; Ni K; Wang X Opt Express; 2017 Jul; 25(14):16028-16039. PubMed ID: 28789121 [TBL] [Abstract][Full Text] [Related]
35. Analysis of fiber bragg gratings by a side-diffraction interference technique. El-Diasty F; Heaney A; Erdogan T Appl Opt; 2001 Feb; 40(6):890-6. PubMed ID: 18357069 [TBL] [Abstract][Full Text] [Related]
37. Subwavelength resist patterning using interference exposure with a deep ultraviolet grating mask: Bragg angle incidence versus normal incidence. Amako J; Sawaki D Appl Opt; 2012 Jun; 51(16):3526-32. PubMed ID: 22695590 [TBL] [Abstract][Full Text] [Related]
38. Fabrication of 150 nm half-pitch grating templates for nanoimprint lithography. Xie SQ; Lu BR; Sun Y; Chen Y; Qu XP; Liu R J Nanosci Nanotechnol; 2009 Feb; 9(2):1437-40. PubMed ID: 19441541 [TBL] [Abstract][Full Text] [Related]
39. Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment. Ma D; Zhao Y; Zeng L Sci Rep; 2017 Apr; 7(1):926. PubMed ID: 28424475 [TBL] [Abstract][Full Text] [Related]