These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
155 related articles for article (PubMed ID: 38781827)
1. Advanced lithography materials: From fundamentals to applications. Zhang Y; Yu H; Wang L; Wu X; He J; Huang W; Ouyang C; Chen D; Keshta BE Adv Colloid Interface Sci; 2024 Jul; 329():103197. PubMed ID: 38781827 [TBL] [Abstract][Full Text] [Related]
2. Recent Advances in Positive Photoresists: Mechanisms and Fabrication. Hassaan M; Saleem U; Singh A; Haque AJ; Wang K Materials (Basel); 2024 May; 17(11):. PubMed ID: 38893815 [TBL] [Abstract][Full Text] [Related]
3. Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography. Hasan MW; Deeb L; Kumaniaev S; Wei C; Wang K Micromachines (Basel); 2024 Aug; 15(9):. PubMed ID: 39337782 [TBL] [Abstract][Full Text] [Related]
4. Single-Component High-Resolution Dual-Tone EUV Photoresists Based on Precision Self-Immolative Polymers. Cen J; Liu W; Xu J; Wang X; Zhang J; Zhang J; Deng Z; Zhou C; Hu J; Liu S Angew Chem Int Ed Engl; 2024 Sep; ():e202415588. PubMed ID: 39305234 [TBL] [Abstract][Full Text] [Related]
5. Two-Photon-Assisted Polymerization and Reduction: Emerging Formulations and Applications. Lay CL; Koh CSL; Lee YH; Phan-Quang GC; Sim HYF; Leong SX; Han X; Phang IY; Ling XY ACS Appl Mater Interfaces; 2020 Mar; 12(9):10061-10079. PubMed ID: 32040295 [TBL] [Abstract][Full Text] [Related]
6. Exceptional Light Sensitivity by Thiol-Ene Click Lithography. Wang Q; Cui H; Wang X; Hu Z; Tao P; Li M; Wang J; Tang Y; Xu H; He X J Am Chem Soc; 2023 Feb; 145(5):3064-3074. PubMed ID: 36625511 [TBL] [Abstract][Full Text] [Related]
7. Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond. Mojarad N; Hojeij M; Wang L; Gobrecht J; Ekinci Y Nanoscale; 2015 Mar; 7(9):4031-7. PubMed ID: 25653148 [TBL] [Abstract][Full Text] [Related]
8. Beyond EUV lithography: a comparative study of efficient photoresists' performance. Mojarad N; Gobrecht J; Ekinci Y Sci Rep; 2015 Mar; 5():9235. PubMed ID: 25783209 [TBL] [Abstract][Full Text] [Related]
9. Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems. Wen Z; Liu X; Chen W; Zhou R; Wu H; Xia Y; Wu L Polymers (Basel); 2024 Mar; 16(6):. PubMed ID: 38543451 [TBL] [Abstract][Full Text] [Related]
10. Si-Containing Reverse-Gradient Block Copolymer for Inorganic Pattern Amplification in EUV Lithography. Park Y; Song SW; Hong J; Jang H; Lee GR; Kim GY; Jung YS ACS Macro Lett; 2024 Aug; 13(8):943-950. PubMed ID: 39008631 [TBL] [Abstract][Full Text] [Related]
11. Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists. Liu J; Wang D; Li Y; Wang H; Chen H; Wang Q; Kang W Polymers (Basel); 2024 Mar; 16(6):. PubMed ID: 38543430 [TBL] [Abstract][Full Text] [Related]
12. Ultrahigh-printing-speed photoresists for additive manufacturing. Liu T; Tao P; Wang X; Wang H; He M; Wang Q; Cui H; Wang J; Tang Y; Tang J; Huang N; Kuang C; Xu H; He X Nat Nanotechnol; 2024 Jan; 19(1):51-57. PubMed ID: 37783856 [TBL] [Abstract][Full Text] [Related]
13. Review of recent advances in inorganic photoresists. Luo C; Xu C; Lv L; Li H; Huang X; Liu W RSC Adv; 2020 Feb; 10(14):8385-8395. PubMed ID: 35497823 [TBL] [Abstract][Full Text] [Related]
14. Single-Step Dual-Layer Photolithography for Tunable and Scalable Nanopatterning. Liu W; Wang J; Xu X; Zhao C; Xu X; Weiss PS ACS Nano; 2021 Jul; 15(7):12180-12188. PubMed ID: 34170108 [TBL] [Abstract][Full Text] [Related]
15. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art. Grigorescu AE; Hagen CW Nanotechnology; 2009 Jul; 20(29):292001. PubMed ID: 19567961 [TBL] [Abstract][Full Text] [Related]
16. Novel Etch-Resistant Molecular Glass Photoresist Based on Pyrene Derivatives for Electron Beam Lithography. Cong X; Zhang S; Gao J; Cui X; Wu Y; Guo X; Hu R; Wang S; Chen J; Li Y; Yang G ACS Omega; 2024 Sep; 9(36):37585-37595. PubMed ID: 39281958 [TBL] [Abstract][Full Text] [Related]
17. Layer-Ordered Organooxotin Clusters for Extreme-Ultraviolet Photolithography. Woo S; Baek JH; Koh C; Nishi T; You Y ACS Appl Mater Interfaces; 2024 Jul; 16(30):39580-39591. PubMed ID: 39037029 [TBL] [Abstract][Full Text] [Related]
18. Fabrication of three-dimensional suspended, interlayered and hierarchical nanostructures by accuracy-improved electron beam lithography overlay. Yoon G; Kim I; So S; Mun J; Kim M; Rho J Sci Rep; 2017 Jul; 7(1):6668. PubMed ID: 28751643 [TBL] [Abstract][Full Text] [Related]