These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
122 related articles for article (PubMed ID: 38793144)
1. Fabrication of Ordered Macropore Arrays in n-Type Silicon Wafer by Anodic Etching Using Double-Tank Electrochemical Cell. Zhang J; Zhang F; Ma M; Liu Z Micromachines (Basel); 2024 Apr; 15(5):. PubMed ID: 38793144 [TBL] [Abstract][Full Text] [Related]
2. Area-selective formation of macropore array by anisotropic electrochemical etching on an n-Si(100) surface in aqueous HF solution. Homma T; Sato H; Mori K; Osaka T; Shoji S J Phys Chem B; 2005 Mar; 109(12):5724-7. PubMed ID: 16851620 [TBL] [Abstract][Full Text] [Related]
4. High Anodic-Voltage Focusing of Charge Carriers in Silicon Enables the Etching of Regularly-Arranged Submicrometer Pores at High Density and High Aspect-Ratio. Cozzi C; Polito G; Strambini LM; Barillaro G Front Chem; 2018; 6():582. PubMed ID: 30560118 [TBL] [Abstract][Full Text] [Related]
5. Metal assisted anodic etching of silicon. Lai CQ; Zheng W; Choi WK; Thompson CV Nanoscale; 2015 Jul; 7(25):11123-34. PubMed ID: 26059556 [TBL] [Abstract][Full Text] [Related]
6. Wafer-scale synthesis of a morphologically controllable silicon ordered array as a platform and its SERS performance. Song J; Feng S; Shi H; Han D; Liu G RSC Adv; 2023 Nov; 13(48):33625-33633. PubMed ID: 38020018 [TBL] [Abstract][Full Text] [Related]
7. Macropore formation in p-type silicon: toward the modeling of morphology. Slimani A; Iratni A; Henry H; Plapp M; Chazalviel JN; Ozanam F; Gabouze N Nanoscale Res Lett; 2014; 9(1):585. PubMed ID: 25386103 [TBL] [Abstract][Full Text] [Related]
8. Sub-100-nm ordered silicon hole arrays by metal-assisted chemical etching. Asoh H; Fujihara K; Ono S Nanoscale Res Lett; 2013 Oct; 8(1):410. PubMed ID: 24090268 [TBL] [Abstract][Full Text] [Related]
9. Triangle pore arrays fabricated on Si (111) substrate by sphere lithography combined with metal-assisted chemical etching and anisotropic chemical etching. Asoh H; Fujihara K; Ono S Nanoscale Res Lett; 2012 Jul; 7(1):406. PubMed ID: 22812920 [TBL] [Abstract][Full Text] [Related]
10. Wafer-scale fabrication of plasmonic crystals from patterned silicon templates prepared by nanosphere lithography. Hall AS; Friesen SA; Mallouk TE Nano Lett; 2013 Jun; 13(6):2623-7. PubMed ID: 23614608 [TBL] [Abstract][Full Text] [Related]
11. Effect of Isopropyl Alcohol Concentration and Etching Time on Wet Chemical Anisotropic Etching of Low-Resistivity Crystalline Silicon Wafer. Abdur-Rahman E; Alghoraibi I; Alkurdi H Int J Anal Chem; 2017; 2017():7542870. PubMed ID: 28831284 [TBL] [Abstract][Full Text] [Related]
12. Ordered arrays of vertically aligned [110] silicon nanowires by suppressing the crystallographically preferred <100> etching directions. Huang Z; Shimizu T; Senz S; Zhang Z; Zhang X; Lee W; Geyer N; Gösele U Nano Lett; 2009 Jul; 9(7):2519-25. PubMed ID: 19480399 [TBL] [Abstract][Full Text] [Related]
13. Wafer-Scale Fabrication of Silicon Nanocones via Controlling Catalyst Evolution in All-Wet Metal-Assisted Chemical Etching. Bian C; Zhang B; Zhang Z; Chen H; Zhang D; Wang S; Ye J; He L; Jie J; Zhang X ACS Omega; 2022 Jan; 7(2):2234-2243. PubMed ID: 35071912 [TBL] [Abstract][Full Text] [Related]
14. Selective etching of n-type silicon in pn junction structure in hydrofluoric acid and its application in silicon nanowire fabrication. Wang H; Jin Z; Zheng Y; Ma H; Li T; Wang Y Nanotechnology; 2008 Apr; 19(17):175307. PubMed ID: 21825671 [TBL] [Abstract][Full Text] [Related]
15. Fabrication of silicon nanowire arrays by near-field laser ablation and metal-assisted chemical etching. Brodoceanu D; Alhmoud HZ; Elnathan R; Delalat B; Voelcker NH; Kraus T Nanotechnology; 2016 Feb; 27(7):075301. PubMed ID: 26778665 [TBL] [Abstract][Full Text] [Related]
16. Fabrication of p-type silicon nanowire arrays with a high aspect ratio using electrochemical and alkaline etching. Jang HS; Choi HJ; Kim JH J Nanosci Nanotechnol; 2012 Apr; 12(4):3567-70. PubMed ID: 22849170 [TBL] [Abstract][Full Text] [Related]
17. A Wafer-Scale Etching Technique for High Aspect Ratio Implantable MEMS Structures. Bhandari R; Negi S; Rieth L; Solzbacher F Sens Actuators A Phys; 2010 Jul; 162(1):130-136. PubMed ID: 20706618 [TBL] [Abstract][Full Text] [Related]
18. Large area fabrication of vertical silicon nanowire arrays by silver-assisted single-step chemical etching and their formation kinetics. Srivastava SK; Kumar D; Schmitt SW; Sood KN; Christiansen SH; Singh PK Nanotechnology; 2014 May; 25(17):175601. PubMed ID: 24717841 [TBL] [Abstract][Full Text] [Related]
19. Patterning of various silicon structures via polymer lithography and catalytic chemical etching. Lee JP; Bang BM; Choi S; Kim T; Park S Nanotechnology; 2011 Jul; 22(27):275305. PubMed ID: 21597138 [TBL] [Abstract][Full Text] [Related]
20. Orientation-dependent nanostructure arrays based on anisotropic silicon wet-etching for repeatable surface-enhanced Raman scattering. Wang CG; Wu XZ; Di D; Dong PT; Xiao R; Wang SQ Nanoscale; 2016 Feb; 8(8):4672-80. PubMed ID: 26853057 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]