These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

119 related articles for article (PubMed ID: 38950350)

  • 1. Enhanced Deposition Selectivity of High-
    Lee JM; Lee SH; Lee JH; Kwak J; Lee J; Kim WH
    ACS Appl Mater Interfaces; 2024 Jul; 16(28):37157-37166. PubMed ID: 38950350
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition.
    Minaye Hashemi FS; Prasittichai C; Bent SF
    ACS Nano; 2015 Sep; 9(9):8710-7. PubMed ID: 26181140
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Direct Growth of Bi
    Park H; Hwang JH; Oh SH; Ryu JJ; Jeon K; Kang M; Chai HJ; Ham A; Kim GH; Kang K; Eom T
    ACS Nano; 2024 Aug; 18(33):22071-22079. PubMed ID: 39102305
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Atomic layer deposited high-k dielectric on graphene by functionalization through atmospheric plasma treatment.
    Shin JW; Kang MH; Oh S; Yang BC; Seong K; Ahn HS; Lee TH; An J
    Nanotechnology; 2018 May; 29(19):195602. PubMed ID: 29461257
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal-Dielectric Patterns.
    Minaye Hashemi FS; Birchansky BR; Bent SF
    ACS Appl Mater Interfaces; 2016 Dec; 8(48):33264-33272. PubMed ID: 27934166
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Structure and Dielectric Property of High-k ZrO
    Liu J; Li J; Wu J; Sun J
    Nanoscale Res Lett; 2019 May; 14(1):154. PubMed ID: 31065821
    [TBL] [Abstract][Full Text] [Related]  

  • 7. From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity.
    Mackus AJM; Merkx MJM; Kessels WMM
    Chem Mater; 2019 Jan; 31(1):2-12. PubMed ID: 30774194
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Effect of Al
    Acharya J; Goul R; Romine D; Sakidja R; Wu J
    ACS Appl Mater Interfaces; 2019 Aug; 11(33):30368-30375. PubMed ID: 31356739
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Chemical Treatment of Low-k Dielectric Surfaces for Patterning of Thin Solid Films in Microelectronic Applications.
    Guo L; Qin X; Zaera F
    ACS Appl Mater Interfaces; 2016 Mar; 8(9):6293-300. PubMed ID: 26956428
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode Applications.
    Lee JH; Kang W; Shin JE; Park BK; Chung TM; Han JH
    ACS Appl Mater Interfaces; 2024 Apr; ():. PubMed ID: 38664939
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Thermal Annealing of Molecular Layer-Deposited Indicone Toward Area-Selective Atomic Layer Deposition.
    Lee S; Kim M; Baek G; Kim HM; Van TTN; Gwak D; Heo K; Shong B; Park JS
    ACS Appl Mater Interfaces; 2020 Sep; 12(38):43212-43221. PubMed ID: 32841556
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms.
    Lodha JK; Meersschaut J; Pasquali M; Billington H; Gendt S; Armini S
    Nanomaterials (Basel); 2024 Jul; 14(14):. PubMed ID: 39057888
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Effects of Ar Addition to O
    Jung H; Oh IK; Yoon CM; Park BE; Lee S; Kwon O; Lee WJ; Kwon SH; Kim WH; Kim H
    ACS Appl Mater Interfaces; 2018 Nov; 10(46):40286-40293. PubMed ID: 30358984
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Area-Selective Atomic Layer Deposition on Metal/Dielectric Patterns: Amphiphobic Coating, Vaporizable Inhibitors, and Regenerative Processing.
    Chang CW; Tseng YH; Hsu CS; Chen JT
    ACS Appl Mater Interfaces; 2023 Jun; 15(23):28817-28824. PubMed ID: 37264593
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Low temperature atomic layer deposition of zirconium oxide for inkjet printed transistor applications.
    Jewel MU; Mahmud MS; Monne MA; Zakhidov A; Chen MY
    RSC Adv; 2019 Jan; 9(4):1841-1848. PubMed ID: 35516157
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Influence of High-κ Dielectrics Integration on ALD-Based MoS
    Mahlouji R; Zhang Y; Verheijen MA; Karwal S; Hofmann JP; Kessels WMM; Bol AA
    ACS Appl Nano Mater; 2024 Aug; 7(16):18786-18800. PubMed ID: 39206351
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Atomic layer deposition SiO
    Yan Y; Ji Y; Yan J; Hu X; Zhang Q; Liu M; Zhang F
    J Mech Behav Biomed Mater; 2021 Feb; 114():104197. PubMed ID: 33221163
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Surface Initiated Polymer Thin Films for the Area Selective Deposition and Etching of Metal Oxides.
    Pattison TG; Hess AE; Arellano N; Lanzillo N; Nguyen S; Bui H; Rettner C; Truong H; Friz A; Topuria T; Fong A; Hughes B; Tek AT; DeSilva A; Miller RD; Qiao GG; Wojtecki RJ
    ACS Nano; 2020 Apr; 14(4):4276-4288. PubMed ID: 32167284
    [TBL] [Abstract][Full Text] [Related]  

  • 19. High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO
    Karasulu B; Roozeboom F; Mameli A
    Adv Mater; 2023 Jun; 35(25):e2301204. PubMed ID: 37043671
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al
    Seo S; Yeo BC; Han SS; Yoon CM; Yang JY; Yoon J; Yoo C; Kim HJ; Lee YB; Lee SJ; Myoung JM; Lee HB; Kim WH; Oh IK; Kim H
    ACS Appl Mater Interfaces; 2017 Nov; 9(47):41607-41617. PubMed ID: 29111636
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 6.