These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

134 related articles for article (PubMed ID: 39246471)

  • 1. Solubility Change Behavior of Fluoroalkyl Ether-Tagged Dendritic Hexaphenol under Extreme UV Exposure.
    Oh HT; Kim G; Jung SH; Ku Y; Lee JK; Kim K; Park BG; Lee S; Koh C; Nishi T; Kim HW
    ACS Omega; 2024 Sep; 9(35):37365-37373. PubMed ID: 39246471
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Extreme UV Resist Exhibiting Synergism between Chemical and Physical Crosslinking Mechanisms.
    Ku Y; Kim K; Oh HT; Park BG; Lee S; Lee JK; Koh C; Nishi T; Kim HW
    Langmuir; 2023 Mar; 39(9):3462-3470. PubMed ID: 36827550
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance.
    Thakur N; Vockenhuber M; Ekinci Y; Watts B; Giglia A; Mahne N; Nannarone S; Castellanos S; Brouwer AM
    ACS Mater Au; 2022 May; 2(3):343-355. PubMed ID: 36855383
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Novel hexameric tin carboxylate clusters as efficient negative-tone EUV photoresists: high resolution with well-defined patterns under low energy doses.
    Wu JR; Lin TA; Wu YR; Chen PH; Gau TS; Lin BJ; Chiu PW; Liu RS
    Nanoscale Adv; 2023 May; 5(11):3033-3043. PubMed ID: 37260503
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam Resist.
    Shi J; Ravi A; Richey NE; Gong H; Bent SF
    ACS Appl Mater Interfaces; 2022 Jun; ():. PubMed ID: 35653232
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning.
    Ashby PD; Olynick DL; Ogletree DF; Naulleau PP
    Adv Mater; 2015 Oct; 27(38):5813-9. PubMed ID: 26079187
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Study of a chemically amplified resist for X-ray lithography by Fourier transform infrared spectroscopy.
    Tan TL; Wong D; Lee P; Rawat RS; Patran A
    Appl Spectrosc; 2004 Nov; 58(11):1288-94. PubMed ID: 18070406
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da).
    Saifullah MSM; Rajak AK; Hofhuis KA; Tiwale N; Mahfoud Z; Testino A; Karadan P; Vockenhuber M; Kazazis D; Valiyaveettil S; Ekinci Y
    ACS Nano; 2024 Sep; 18(35):24076-24094. PubMed ID: 39163414
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography.
    Wu L; Hilbers MF; Lugier O; Thakur N; Vockenhuber M; Ekinci Y; Brouwer AM; Castellanos S
    ACS Appl Mater Interfaces; 2021 Nov; 13(43):51790-51798. PubMed ID: 34669380
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Planning Implications Related to Sterilization-Sensitive Science Investigations Associated with Mars Sample Return (MSR).
    Velbel MA; Cockell CS; Glavin DP; Marty B; Regberg AB; Smith AL; Tosca NJ; Wadhwa M; Kminek G; Meyer MA; Beaty DW; Carrier BL; Haltigin T; Hays LE; Agee CB; Busemann H; Cavalazzi B; Debaille V; Grady MM; Hauber E; Hutzler A; McCubbin FM; Pratt LM; Smith CL; Summons RE; Swindle TD; Tait KT; Udry A; Usui T; Westall F; Zorzano MP
    Astrobiology; 2022 Jun; 22(S1):S112-S164. PubMed ID: 34904892
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Layer-Ordered Organooxotin Clusters for Extreme-Ultraviolet Photolithography.
    Woo S; Baek JH; Koh C; Nishi T; You Y
    ACS Appl Mater Interfaces; 2024 Jul; 16(30):39580-39591. PubMed ID: 39037029
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Single-Component High-Resolution Dual-Tone EUV Photoresists Based on Precision Self-Immolative Polymers.
    Cen J; Liu W; Xu J; Wang X; Zhang J; Zhang J; Deng Z; Zhou C; Hu J; Liu S
    Angew Chem Int Ed Engl; 2024 Sep; ():e202415588. PubMed ID: 39305234
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Synthesis of pentameric chlorotin carboxylate clusters for high resolution EUV photoresists under small doses.
    Li CD; Lin TA; Chen PH; Gau TS; Lin BJ; Chiu PW; Liu JH
    Nanoscale Adv; 2024 May; 6(11):2928-2944. PubMed ID: 38817434
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Radiation-sensitive novel polymeric resist materials: iterative synthesis and their EUV fragmentation studies.
    Satyanarayana VS; Kessler F; Singh V; Scheffer FR; Weibel DE; Ghosh S; Gonsalves KE
    ACS Appl Mater Interfaces; 2014 Mar; 6(6):4223-32. PubMed ID: 24576018
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Additive-Assisted Forming High-Quality Thin Films of Sn-Oxo Cluster for Nanopatterning.
    Zhao Y; Huang X; Si Y; Zheng L; Chen H; Zhao J; Luo F; Zhang J; Chen P; Peng X
    ACS Appl Mater Interfaces; 2024 Aug; 16(31):41659-41668. PubMed ID: 39047062
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Effect of Oxygen on Thermal and Radiation-Induced Chemistries in a Model Organotin Photoresist.
    Frederick RT; Diulus JT; Hutchison DC; Nyman M; Herman GS
    ACS Appl Mater Interfaces; 2019 Jan; 11(4):4514-4522. PubMed ID: 30606004
    [TBL] [Abstract][Full Text] [Related]  

  • 17. FT-IR study of a chemically amplified resist for X-ray lithography.
    Tan TL; Kudryashov VA; Tan BL
    Appl Spectrosc; 2003 Jul; 57(7):842-9. PubMed ID: 14658664
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Key Role of Very Low Energy Electrons in Tin-Based Molecular Resists for Extreme Ultraviolet Nanolithography.
    Bespalov I; Zhang Y; Haitjema J; Tromp RM; van der Molen SJ; Brouwer AM; Jobst J; Castellanos S
    ACS Appl Mater Interfaces; 2020 Feb; 12(8):9881-9889. PubMed ID: 32019303
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Ambient-Pressure X-ray Photoelectron Spectroscopy Characterization of Radiation-Induced Chemistries of Organotin Clusters.
    Diulus JT; Frederick RT; Li M; Hutchison DC; Olsen MR; Lyubinetsky I; Árnadóttir L; Garfunkel EL; Nyman M; Ogasawara H; Herman GS
    ACS Appl Mater Interfaces; 2019 Jan; 11(2):2526-2534. PubMed ID: 30575394
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Beyond EUV lithography: a comparative study of efficient photoresists' performance.
    Mojarad N; Gobrecht J; Ekinci Y
    Sci Rep; 2015 Mar; 5():9235. PubMed ID: 25783209
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 7.