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  • Title: Photoreaction of aromatic compounds at alpha-FeOOH/H2O interface in the presence of H2O2: evidence for organic-goethite surface complex formation.
    Author: He J, Ma W, Song W, Zhao J, Qian X, Zhang S, Yu JC.
    Journal: Water Res; 2005 Jan; 39(1):119-28. PubMed ID: 15607171.
    Abstract:
    The photoreactions of aromatic compounds were investigated in aqueous dispersions of alpha-FeOOH(goethite)/H(2)O(2) at neutral pHs. It was found that aromatic compounds could undergo rapid decomposition and mineralization (even to 100% yield) in the presence of both alpha-FeOOH and H(2)O(2) under UV irradiation, and the degradation rates of the organics were related to their sorption ability of the surface of alpha-FeOOH and were in the following order: salicylic acid approximately m-hydroxylbenzoic acid>p-hydroxylbenzoic acid approximately benzoic acid>p-biphthalic acid>phenol>benzenesulfonic acid. The interactions of salicylic acid and benzenesulfonic acid with goethite were examined by Fourier transform infrared spectroscopy (FTIR), and electron spin resonance (ESR) was applied to detect the intermediate radicals formed in the photoreaction. The effect of pH and foreign ligands on the degradation of salicylic acid, decomposition of H(2)O(2), and formation of dissolved iron was also examined.
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