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  • Title: Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers.
    Author: Zubkov T, Lucassen AC, Freeman D, Feldman Y, Cohen SR, Evmenenko G, Dutta P, van der Boom ME.
    Journal: J Phys Chem B; 2005 Jul 28; 109(29):14144-53. PubMed ID: 16852776.
    Abstract:
    Trimethoxy-[11-(2-nitrobenzyloxy)undecyl]silane (1) and trimethoxy-[17-(2-nitrobenzyloxy)heptadecyl]silane (2) have been used for the covalent assembly of siloxane-based photopatternable monolayers. Exposing the monolayers to UV light (312 +/- 10 nm) results in the generation of reactive hydroxyl-terminated monolayers without affecting the film quality. The new monolayers, deprotection chemistry, and the effect of photoinduced headgroup lift-off on the monolayer microstructure have been studied in detail by a full complement of physicochemical techniques, including optical (UV-vis) spectroscopy, ellipsometry, aqueous contact angle (CA) measurements, X-ray photoelectron spectroscopy (XPS), synchrotron X-ray reflectivity (XRR), and atomic force microscopy (AFM and AFM-force spectroscopy). AFM-force spectroscopy was used to analyze hydrogen-bond interactions as a function of the nature of the solid-liquid interface. AFM-force spectroscopy indicates a hydrogen-bond energy for photodeprotected monolayers of 8.2 kJ mol(-1) (approximately 2 kcal mol(-1)). Scanning electron microscopy (SEM) revealed that treatment of photopatterned monolayers with ZnEt2 solutions resulted in well-defined approximately 2 microm x 2 microm features of 10 A thick ZnO layers.
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