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  • Title: Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media.
    Author: Brombacher C, Saitner M, Pfahler C, Plettl A, Ziemann P, Makarov D, Assmann D, Siekman MH, Abelmann L, Albrecht M.
    Journal: Nanotechnology; 2009 Mar 11; 20(10):105304. PubMed ID: 19417519.
    Abstract:
    Plasma etching of densely packed arrays of polystyrene particles leads to arrays of spherical nanostructures with adjustable diameters while keeping the periodicity fixed. A linear dependence between diameter of the particles and etching time was observed for particles down to sizes of sub-50 nm. Subsequent deposition of Co/Pt multilayers with perpendicular magnetic anisotropy onto these patterns leads to an exchange-decoupled, single-domain magnetic nanostructure array surrounded by a continuous magnetic film. The magnetic reversal characteristic of the film-particle system is dominated by domain nucleation and domain wall pinning at the particle locations, creating a percolated perpendicular media system.
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