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  • Title: Highly efficient damage-free correction of thickness distribution of quartz crystal wafers by atmospheric pressure plasma etching.
    Author: Yamamura K, Morikawa T, Ueda M, Nagano M, Zettsu N, Shibahara M.
    Journal: IEEE Trans Ultrason Ferroelectr Freq Control; 2009 Jun; 56(6):1128-30. PubMed ID: 19574119.
    Abstract:
    A new finishing method was developed to correct the thickness distribution of a quartz crystal wafer by the numerically controlled scanning of a localized atmospheric pressure plasma. The thickness uniformity level of a commercially available AT-cut quartz crystal wafer was improved to less than 50 nm without any subsurface damage by applying one correction process. Furthermore, applying a pulse-modulated plasma markedly decreased the correction time of the thickness distribution without breaking the quartz crystal wafer by thermal stress.
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