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  • Title: Grayscale photomask fabricated by laser direct writing in metallic nano-films.
    Author: Guo CF, Cao S, Jiang P, Fang Y, Zhang J, Fan Y, Wang Y, Xu W, Zhao Z, Liu Q.
    Journal: Opt Express; 2009 Oct 26; 17(22):19981-7. PubMed ID: 19997222.
    Abstract:
    The grayscale photomask plays a key role in grayscale lithography for creating 3D microstructures like micro-optical elements and MEMS structures, but how to fabricate grayscale masks in a cost-effective way is still a big challenge. Here we present novel low cost grayscale masks created in a two-step method by laser direct writing on Sn nano-films, which demonstrate continuous-tone gray levels depended on writing powers. The mechanism of the gray levels is due to the coexistence of the metal and the oxides formed in a laser-induced thermal process. The photomasks reveal good technical properties in fabricating 3D microstructures for practical applications.
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