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  • Title: Direct patterning of silicon oxide on Si-substrate induced by femtosecond laser.
    Author: Kiani A, Venkatakrishnan K, Tan B.
    Journal: Opt Express; 2010 Feb 01; 18(3):1872-8. PubMed ID: 20174014.
    Abstract:
    In this study we report for the first time a method for direct patterning of silicon oxide on a silicon substrate by irradiation with a femtosecond laser of Mega Hertz pulse frequency under ambient condition. Embossed lines of silicon oxide with around 3 approximately 4 microm width and less than 100 nm height were formed by controlling the parameters such as laser pulse power and frequency rate. A Scanning Electron Microscope (SEM), an optical microscopy and a Micro-Raman and Energy Dispersive X-ray (EDX) spectroscopy were used to analyze the silicon oxide layer.
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