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  • Title: Nanolithography of single-layer graphene oxide films by atomic force microscopy.
    Author: Lu G, Zhou X, Li H, Yin Z, Li B, Huang L, Boey F, Zhang H.
    Journal: Langmuir; 2010 May 04; 26(9):6164-6. PubMed ID: 20369895.
    Abstract:
    Atomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO(2) substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns as templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications.
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