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  • Title: Assessment of the UV/chlorine process as an advanced oxidation process.
    Author: Jin J, El-Din MG, Bolton JR.
    Journal: Water Res; 2011 Feb; 45(4):1890-6. PubMed ID: 21211812.
    Abstract:
    Several organic compounds were used as radical scavengers/reagents to investigate the possibility of the UV/chlorine process being used as an advanced oxidation process (AOP) in the treatment of drinking water and wastewater. The UV/H(2)O(2) process was selected as a reference, so that the results from the UV/chlorine process could be compared with those of the UV/H(2)O(2) process. Methanol was added to active chlorine solutions at both pH 5 and 10 and into hydrogen peroxide samples. The photodegradation quantum yields and the OH radical production yield factors, which are significant in evaluating AOPs, were calculated for both the UV/chlorine and the UV/H(2)O(2) processes. The yield factor for the UV/chlorine process at pH 5 was 0.46 ± 0.09, which is much lower than that of the UV/H(2)O(2) process, which reached 0.85 ± 0.04. In addition to methanol, para-chlorobenzoic acid (pCBA) and cyclohexanoic acid (CHA) were added to active chlorine solutions and to H(2)O(2) solutions, to evaluate the efficiencies of oxidizing these organic compounds. The specific first-order reaction rate constants for the oxidation of pCBA and CHA, using the UV/chlorine process, were lower than those found using the UV/H(2)O(2) process.
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