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Title: High-quality graphene p-n junctions via resist-free fabrication and solution-based noncovalent functionalization. Author: Cheng HC, Shiue RJ, Tsai CC, Wang WH, Chen YT. Journal: ACS Nano; 2011 Mar 22; 5(3):2051-9. PubMed ID: 21322639. Abstract: An essential issue in graphene nanoelectronics is to engineer the carrier type and density and still preserve the unique band structure of graphene. We report the realization of high-quality graphene p-n junctions by noncovalent chemical functionalization. A generic scheme for the graphene p-n junction fabrication is established by combining the resist-free approach and spatially selective chemical modification process. The effectiveness of the chemical functionalization is systematically confirmed by surface topography and potential measurements, spatially resolved Raman spectroscopic imaging, and transport/magnetotransport measurements. The transport characteristics of graphene p-n junctions are presented with observations of high carrier mobilities, Fermi energy difference, and distinct quantum Hall plateaus. The chemical functionalization of graphene p-n junctions demonstrated in this study is believed to be a feasible scheme for modulating the doping level in graphene for future graphene-based nanoelectronics.[Abstract] [Full Text] [Related] [New Search]