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Title: Enhanced performance of InGaN/GaN based solar cells with an In(0.05)Ga(0.95)N ultra-thin inserting layer between GaN barrier and In(0.2)Ga(0.8)N well. Author: Ren Z, Chao L, Chen X, Zhao B, Wang X, Tong J, Zhang J, Zhuo X, Li D, Yi H, Li S. Journal: Opt Express; 2013 Mar 25; 21(6):7118-24. PubMed ID: 23546093. Abstract: The effect of ultra-thin inserting layer (UIL) on the photovoltaic performances of InGaN/GaN solar cells is investigated. With UIL implemented, the open-circuit voltage was increased from 1.4 V to 1.7 V, short-circuit current density was increased by 65% and external quantum efficiency was increased by 59%, compared to its counterparts at room temperature under 1-sun AM1.5G illumination. The improvements in electrical and photovoltaic properties are mainly attributed to the UIL which can boost the crystal quality and alleviate strain. Moreover, it can act as a transition layer for higher indium incorporation and an effective light sub-absorption layer in multiple quantum wells.[Abstract] [Full Text] [Related] [New Search]