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  • Title: Electronic Transport Properties of Epitaxial Si/SiGe Heterostructures Grown on Single-Crystal SiGe Nanomembranes.
    Author: Li YS, Sookchoo P, Cui X, Mohr R, Savage DE, Foote RH, Jacobson RB, Sánchez-Pérez JR, Paskiewicz DM, Wu X, Ward DR, Coppersmith SN, Eriksson MA, Lagally MG.
    Journal: ACS Nano; 2015 May 26; 9(5):4891-9. PubMed ID: 25932940.
    Abstract:
    To assess possible improvements in the electronic performance of two-dimensional electron gases (2DEGs) in silicon, SiGe/Si/SiGe heterostructures are grown on fully elastically relaxed single-crystal SiGe nanomembranes produced through a strain engineering approach. This procedure eliminates the formation of dislocations in the heterostructure. Top-gated Hall bar devices are fabricated to enable magnetoresistivity and Hall effect measurements. Both Shubnikov-de Haas oscillations and the quantum Hall effect are observed at low temperatures, demonstrating the formation of high-quality 2DEGs. Values of charge carrier mobility as a function of carrier density extracted from these measurements are at least as high or higher than those obtained from companion measurements made on heterostructures grown on conventional strain graded substrates. In all samples, impurity scattering appears to limit the mobility.
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