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  • Title: Electrical Homogeneity of Large-Area Chemical Vapor Deposited Multilayer Hexagonal Boron Nitride Sheets.
    Author: Hui F, Fang W, Leong WS, Kpulun T, Wang H, Yang HY, Villena MA, Harris G, Kong J, Lanza M.
    Journal: ACS Appl Mater Interfaces; 2017 Nov 22; 9(46):39895-39900. PubMed ID: 29110457.
    Abstract:
    Large-area hexagonal boron nitride (h-BN) can be grown on polycrystalline metallic substrates via chemical vapor deposition (CVD), but the impact of local inhomogeneities on the electrical properties of the h-BN and their effect in electronic devices is unknown. Conductive atomic force microscopy (CAFM) and probe station characterization show that the tunneling current across the h-BN stack fluctuates up to 3 orders of magnitude from one substrate (Pt) grain to another. Interestingly, the variability in the tunneling current across the h-BN within the same substrate grain is very low, which may enable the use of CVD-grown h-BN in ultra scaled technologies.
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