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Title: Fabrication and Characterization of a Metallic-Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application. Author: Chou Chau YF, Chen KH, Chiang HP, Lim CM, Huang HJ, Lai CH, Kumara NTRN. Journal: Nanomaterials (Basel); 2019 Nov 26; 9(12):. PubMed ID: 31779222. Abstract: In this paper, a periodic metallic-dielectric nanorod array which consists of Si nanorods coated with 30 nm Ag thin film set in a hexagonal configuration is fabricated and characterized. The fabrication procedure is performed by using nanosphere lithography with reactive ion etching, followed by Ag thin-film deposition. The mechanism of the surface and gap plasmon modes supported by the fabricated structure is numerically demonstrated by the three-dimensional finite element method. The measured and simulated absorptance spectra are observed to have a same trend and a qualitative fit. Our fabricated plasmonic sensor shows an average sensitivity of 340.0 nm/RIU when applied to a refractive index sensor ranging from 1.0 to 1.6. The proposed substrates provide a practical plasmonic nanorod-based sensing platform, and the fabrication methods used are technically effective and low-cost.[Abstract] [Full Text] [Related] [New Search]