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  • Title: Influence of 9.3 µm CO2 and Er:YAG laser preparations on marginal adaptation of adhesive mixed Class V composite restorations with one component universal adhesive.
    Author: Anton Y Otero CI, Bortolotto T, DiBella E, Krejci I.
    Journal: Am J Dent; 2021 Feb; 34(1):31-38. PubMed ID: 33544986.
    Abstract:
    PURPOSE: To examine the marginal adaptation in enamel and dentin of mixed Class V saucer shaped restorations where cavities were prepared by two different lasers. METHODS: A handpiece-integrated Er:YAG laser @ 4.5 W, 300 mJ, 15 Hz (LiteTouch III) and a novel CO2 laser @ 12.95 W, 19.3 mJ, 671 Hz (Solea 9.3 µm). Diamond bur preparation with a 25 µm diamond bur (Intensiv) in a red contra angle at high speed under water spray cooling served as the control. Eight cavities per group were readied and restored under simulation of dentin fluid with a one bottle universal adhesive (One Coat 7 Universal) and a nanohybrid resin composite (Everglow), applied in two layers. For every preparation technique, the adhesive system was applied in the selective-etch and the self-etch mode, resulting in six experimental groups. Marginal analysis was performed immediately after polishing and after simultaneous thermal (5-50°C, 2 minutes each) and mechanical (max. 49 N; 200,000 cycles) loading by using a SEM (x200 magnification). RESULTS: Significant differences were found for all groups - except groups 2 and 5 - between initial and terminal results and between the groups as well (P< 0.05, 2-way ANOVA with Fisher's post-hoc test). The bur prepared group with selective-etch technique showed the best overall results after loading, followed by Er:YAG prepared self-etch group and CO2-prepared selective-etch group. CLINICAL SIGNIFICANCE: By using a universal one-component adhesive system, marginal adaptation in enamel and in dentin depended on the preparation method and on the adhesive's application technique as well. When using lasers, Er:YAG in self-etch mode and CO2 9.3 µm in selective-etch mode total marginal adaptation showed results which were comparable to conventional bur preparation with selective-etch technique.
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