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Title: High-Resolution Laser Interference Ablation and Amorphization of Silicon. Author: Blumenstein A, Simon P, Ihlemann J. Journal: Nanomaterials (Basel); 2023 Aug 03; 13(15):. PubMed ID: 37570557. Abstract: The laser interference patterning of a silicon surface via UV femtosecond pulse irradiation, resulting in 350 nm periodic structures, is demonstrated. The structuring process was performed using a laser with a 450 fs pulse duration at a wavelength of 248 nm in combination with a mask projection setup. Depending on the laser fluence, single-pulse irradiation leads to amorphization, structure formation via lateral melt flow or the formation of voids via peculiar melt coalescence. Through multipulse irradiation, combined patterns of interference structures and laser-induced periodic surface structures (LIPSS) are observed.[Abstract] [Full Text] [Related] [New Search]