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Journal Abstract Search

394 related items for PubMed ID: 19123860

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  • 2. Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymers.
    George SM, Yoon B, Dameron AA.
    Acc Chem Res; 2009 Apr 21; 42(4):498-508. PubMed ID: 19249861
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  • 4. Nonfluorinated volatile copper(I) 1,3-diketiminates as precursors for Cu metal deposition via atomic layer deposition.
    Park KH, Bradley AZ, Thompson JS, Marshall WJ.
    Inorg Chem; 2006 Oct 16; 45(21):8480-2. PubMed ID: 17029355
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  • 5. Laser desorption time-of-flight mass spectrometry of atomic switch memory Ge2Sb2Te5 bulk materials and its thin films.
    Houška J, Peña-Méndez EM, Kolář J, Přikryl J, Pavlišta M, Frumar M, Wágner T, Havel J.
    Rapid Commun Mass Spectrom; 2014 Apr 15; 28(7):699-704. PubMed ID: 24573800
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  • 7. Atomic layer deposition and tellurization of Ge-Sb film for phase-change memory applications.
    Kim Y, Han B, Kim YJ, Shin J, Kim S, Hidayat R, Park JM, Koh W, Lee WJ.
    RSC Adv; 2019 May 29; 9(30):17291-17298. PubMed ID: 35519870
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  • 12. Atomic layer deposition chemistry: recent developments and future challenges.
    Leskelä M, Ritala M.
    Angew Chem Int Ed Engl; 2003 Nov 24; 42(45):5548-54. PubMed ID: 14639717
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  • 13. The single molecular precursor approach to metal telluride thin films: imino-bis(diisopropylphosphine tellurides) as examples.
    Ritch JS, Chivers T, Afzaal M, O'Brien P.
    Chem Soc Rev; 2007 Oct 24; 36(10):1622-31. PubMed ID: 17721586
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  • 14. Growth of iron cobalt oxides by atomic layer deposition.
    Lie M, Barnholt Klepper K, Nilsen O, Fjellvåg H, Kjekshus A.
    Dalton Trans; 2008 Jan 14; (2):253-9. PubMed ID: 18097492
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  • 16. Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices.
    Ansari MZ, Nandi DK, Janicek P, Ansari SA, Ramesh R, Cheon T, Shong B, Kim SH.
    ACS Appl Mater Interfaces; 2019 Nov 20; 11(46):43608-43621. PubMed ID: 31633331
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  • 20. Atomic layer deposition of TiO2 from TiI4 and H2O onto SiO2 surfaces: ab initio calculations of the initial reaction mechanisms.
    Hu Z, Turner CH.
    J Am Chem Soc; 2007 Apr 04; 129(13):3863-78. PubMed ID: 17346043
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