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219 related items for PubMed ID: 21456186
1. Effect on thickness of Al layer in poly-crystalline Si thin films using aluminum(Al) induced crystallization method. Jeong C, Na HS, Lee SH. J Nanosci Nanotechnol; 2011 Feb; 11(2):1350-3. PubMed ID: 21456186 [Abstract] [Full Text] [Related]
7. Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon. Ben Slama S, Hajji M, Ezzaouia H. Nanoscale Res Lett; 2012 Aug 17; 7(1):464. PubMed ID: 22901341 [Abstract] [Full Text] [Related]
8. [Preparation and characterization of poly-Si films on different topography substrates by AIC]. Wang CL, Fan DW, Liu HZ, Zhang FJ, Xing D, Liu SH. Guang Pu Xue Yu Guang Pu Fen Xi; 2009 Mar 17; 29(3):752-5. PubMed ID: 19455815 [Abstract] [Full Text] [Related]
9. Surface plasmon effect of Ag nanodots embedded in amorphous Si window layers deposited on Si solar cells. Park S, Ji H, Kim MJ, Peck JH, Kim K. J Nanosci Nanotechnol; 2014 Dec 17; 14(12):9210-8. PubMed ID: 25971039 [Abstract] [Full Text] [Related]
10. Ag Nanodots Emitters Embedded in a Nanocrystalline Thin Film Deposited on Crystalline Si Solar Cells. Park S, Ryu SG, Ji H, Kim MJ, Peck JH, Kim K. J Nanosci Nanotechnol; 2016 Jun 17; 16(6):6018-26. PubMed ID: 27427665 [Abstract] [Full Text] [Related]
15. Thermokinetic Study of Aluminum-Induced Crystallization of a-Si: The Effect of Al Layer Thickness. Zharkov SM, Yumashev VV, Moiseenko ET, Altunin RR, Solovyov LA, Volochaev MN, Zeer GM, Nikolaeva NS, Belousov OV. Nanomaterials (Basel); 2023 Nov 10; 13(22):. PubMed ID: 37999279 [Abstract] [Full Text] [Related]
16. Transmission electron microscopy and X-Ray diffraction analysis of aluminum-induced crystallization of amorphous silicon in alpha-Si:H/Al and Al/alpha-Si:H structures. Kishore R, Hotz C, Naseem HA, Brown WD. Microsc Microanal; 2005 Apr 10; 11(2):133-7. PubMed ID: 15817142 [Abstract] [Full Text] [Related]
17. Bioactivity of polycrystalline silicon layers. Pramatarova L, Pecheva E, Montgomery P, Dimova-Malinovska D, Petrov T, Toth AL, Dimitrova M. J Nanosci Nanotechnol; 2008 Feb 10; 8(2):924-30. PubMed ID: 18464428 [Abstract] [Full Text] [Related]
19. Effect of the initial structure on the electrical property of crystalline silicon films deposited on glass by hot-wire chemical vapor deposition. Chung YB, Lee SH, Bae SH, Park HK, Jung JS, Hwang NM. J Nanosci Nanotechnol; 2012 Jul 10; 12(7):5947-51. PubMed ID: 22966686 [Abstract] [Full Text] [Related]
20. Temperature-Dependent HfO2/Si Interface Structural Evolution and its Mechanism. Zhang XY, Hsu CH, Lien SY, Wu WY, Ou SL, Chen SY, Huang W, Zhu WZ, Xiong FB, Zhang S. Nanoscale Res Lett; 2019 Mar 07; 14(1):83. PubMed ID: 30847661 [Abstract] [Full Text] [Related] Page: [Next] [New Search]