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Journal Abstract Search

446 related items for PubMed ID: 22456229

  • 1. Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications.
    Cushen JD, Otsuka I, Bates CM, Halila S, Fort S, Rochas C, Easley JA, Rausch EL, Thio A, Borsali R, Willson CG, Ellison CJ.
    ACS Nano; 2012 Apr 24; 6(4):3424-33. PubMed ID: 22456229
    [Abstract] [Full Text] [Related]

  • 2. Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly.
    Farrell RA, Kinahan NT, Hansel S, Stuen KO, Petkov N, Shaw MT, West LE, Djara V, Dunne RJ, Varona OG, Gleeson PG, Jung SJ, Kim HY, Koleśnik MM, Lutz T, Murray CP, Holmes JD, Nealey PF, Duesberg GS, Krstić V, Morris MA.
    Nanoscale; 2012 May 21; 4(10):3228-36. PubMed ID: 22481430
    [Abstract] [Full Text] [Related]

  • 3. Nanostructured films of amphiphilic fluorinated block copolymers for fouling release application.
    Martinelli E, Agostini S, Galli G, Chiellini E, Glisenti A, Pettitt ME, Callow ME, Callow JA, Graf K, Bartels FW.
    Langmuir; 2008 Nov 18; 24(22):13138-47. PubMed ID: 18928304
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  • 5. Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.
    Stoykovich MP, Kang H, Daoulas KCh, Liu G, Liu CC, de Pablo JJ, Müller M, Nealey PF.
    ACS Nano; 2007 Oct 18; 1(3):168-75. PubMed ID: 19206647
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  • 8. Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks.
    Girardot C, Böhme S, Archambault S, Salaün M, Latu-Romain E, Cunge G, Joubert O, Zelsmann M.
    ACS Appl Mater Interfaces; 2014 Sep 24; 6(18):16276-82. PubMed ID: 25111901
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  • 9. Polylactide-poly(dimethylsiloxane)-polylactide triblock copolymers as multifunctional materials for nanolithographic applications.
    Rodwogin MD, Spanjers CS, Leighton C, Hillmyer MA.
    ACS Nano; 2010 Feb 23; 4(2):725-32. PubMed ID: 20112923
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  • 10. Effect of film thickness and domain spacing on defect densities in directed self-assembly of cylindrical morphology block copolymers.
    Mishra V, Fredrickson GH, Kramer EJ.
    ACS Nano; 2012 Mar 27; 6(3):2629-41. PubMed ID: 22339501
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  • 11. Towards nanoporous membranes based on ABC triblock terpolymers.
    Sperschneider A, Schacher F, Gawenda M, Tsarkova L, Müller AH, Ulbricht M, Krausch G, Köhler J.
    Small; 2007 Jun 27; 3(6):1056-63. PubMed ID: 17450513
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  • 13. Robust block copolymer mask for nanopatterning polymer films.
    Chao CC, Wang TC, Ho RM, Georgopanos P, Avgeropoulos A, Thomas EL.
    ACS Nano; 2010 Apr 27; 4(4):2088-94. PubMed ID: 20201544
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  • 14. Poly(cyclohexylethylene)-block-Poly(lactide) Oligomers for Ultrasmall Nanopatterning Using Atomic Layer Deposition.
    Yao L, Oquendo LE, Schulze MW, Lewis RM, Gladfelter WL, Hillmyer MA.
    ACS Appl Mater Interfaces; 2016 Mar 23; 8(11):7431-9. PubMed ID: 26954771
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  • 15. All-conjugated block copolymers.
    Scherf U, Gutacker A, Koenen N.
    Acc Chem Res; 2008 Sep 23; 41(9):1086-97. PubMed ID: 18402471
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  • 16. Long-range ordered thin films of block copolymers prepared by zone-casting and their thermal conversion into ordered nanostructured carbon.
    Tang C, Tracz A, Kruk M, Zhang R, Smilgies DM, Matyjaszewski K, Kowalewski T.
    J Am Chem Soc; 2005 May 18; 127(19):6918-9. PubMed ID: 15884912
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  • 17. Electrical biomolecule detection using nanopatterned silicon via block copolymer lithography.
    Jeong CK, Jin HM, Ahn JH, Park TJ, Yoo HG, Koo M, Choi YK, Kim SO, Lee KJ.
    Small; 2014 Jan 29; 10(2):337-43. PubMed ID: 23881835
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  • 19. Molecular transfer printing using block copolymers.
    Ji S, Liu CC, Liu G, Nealey PF.
    ACS Nano; 2010 Feb 23; 4(2):599-609. PubMed ID: 20041629
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