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Journal Abstract Search

295 related items for PubMed ID: 24245284

  • 1. Study of nanocrystalline silicon films synthesized Below 100 degrees C by catalytic chemical vapor deposition.
    Song TH, Keum KS, Hong WS.
    J Nanosci Nanotechnol; 2013 Nov; 13(11):7519-23. PubMed ID: 24245284
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  • 2. Optical and structural properties of nanocrystalline silicon potential well structure fabricated by cat-chemical vapor deposition at 200 degrees C.
    Kang SY, Keum KS, Song TH, Hong WS.
    J Nanosci Nanotechnol; 2013 Nov; 13(11):7568-71. PubMed ID: 24245293
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  • 3. Highly conducting phosphorous doped Nc-Si:H thin films deposited at high deposition rate by hot-wire chemical vapor deposition method.
    Waman VS, Kamble MM, Ghosh SS, Mayabadi A, Sathe VG, Amalnekar DP, Pathan HM, Jadkar SR.
    J Nanosci Nanotechnol; 2012 Nov; 12(11):8459-66. PubMed ID: 23421231
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  • 9. Growth of silicon nanoclusters on different substrates by plasma enhanced chemical vapor deposition.
    Monroy BM, Santana G, Fandiõ J, Ortiz A, Alonso JC.
    J Nanosci Nanotechnol; 2006 Dec; 6(12):3752-5. PubMed ID: 17256325
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  • 12. Synthesis of Si nanosheets by a chemical vapor deposition process and their blue emissions.
    Kim U, Kim I, Park Y, Lee KY, Yim SY, Park JG, Ahn HG, Park SH, Choi HJ.
    ACS Nano; 2011 Mar 22; 5(3):2176-81. PubMed ID: 21322533
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  • 13. Thin film solar cells with Si nanocrystallites embedded in amorphous intrinsic layers by hot-wire chemical vapor deposition.
    Park S, Parida B, Kim K.
    J Nanosci Nanotechnol; 2013 May 22; 13(5):3397-402. PubMed ID: 23858866
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  • 18. Synthesis of carbon nanotubes using Ni95Ti5 nanocrystalline film as a catalyst.
    Khan S, Khan ZH, Tripathi KN, Husain M.
    J Nanosci Nanotechnol; 2007 Jun 22; 7(6):1855-9. PubMed ID: 17654954
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  • 19. Polycrystalline silicon films with nanometer-sized dense fine grains formed by flash-lamp-induced crystallization.
    Ohdaira K, Ishii S, Tomura N, Matsumura H.
    J Nanosci Nanotechnol; 2012 Jan 22; 12(1):591-5. PubMed ID: 22524025
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  • 20. Anisotropic lithiation behavior of crystalline silicon.
    Wagesreither S, Lugstein A, Bertagnolli E.
    Nanotechnology; 2012 Dec 14; 23(49):495716. PubMed ID: 23165459
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