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Journal Abstract Search

234 related items for PubMed ID: 25000367

  • 1. Structural transitions in asymmetric poly(styrene)-block-poly(lactide) thin films induced by solvent vapor exposure.
    Sinturel C, Grosso D, Boudot M, Amenitsch H, Hillmyer MA, Pineau A, Vayer M.
    ACS Appl Mater Interfaces; 2014 Aug 13; 6(15):12146-52. PubMed ID: 25000367
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  • 2. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application.
    Cummins C, Mokarian-Tabari P, Andreazza P, Sinturel C, Morris MA.
    ACS Appl Mater Interfaces; 2016 Mar 13; 8(12):8295-304. PubMed ID: 26950246
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  • 3. Pathways of cylindrical orientations in PS-b-P4VP diblock copolymer thin films upon solvent vapor annealing.
    Gowd EB, Koga T, Endoh MK, Kumar K, Stamm M.
    Soft Matter; 2014 Oct 21; 10(39):7753-61. PubMed ID: 25142254
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  • 6. Well-Ordered Nanoporous ABA Copolymer Thin Films via Solvent Vapor Annealing, Homopolymer Blending, and Selective Etching of ABAC Tetrablock Terpolymers.
    Jackson EA, Lee Y, Radlauer MR, Hillmyer MA.
    ACS Appl Mater Interfaces; 2015 Dec 16; 7(49):27331-9. PubMed ID: 26642426
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  • 9. Structural evolution of perpendicular lamellae in diblock copolymer thin films during solvent vapor treatment investigated by grazing-incidence small-angle X-ray scattering.
    Zhang J, Posselt D, Sepe A, Shen X, Perlich J, Smilgies DM, Papadakis CM.
    Macromol Rapid Commun; 2013 Aug 16; 34(16):1289-95. PubMed ID: 23843127
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  • 10. An in situ grazing incidence X-ray scattering study of block copolymer thin films during solvent vapor annealing.
    Gu X, Gunkel I, Hexemer A, Gu W, Russell TP.
    Adv Mater; 2014 Jan 15; 26(2):273-81. PubMed ID: 24282077
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  • 13. Study of the kinetics and mechanism of rapid self-assembly in block copolymer thin films during solvo-microwave annealing.
    Mokarian-Tabari P, Cummins C, Rasappa S, Simao C, Sotomayor Torres CM, Holmes JD, Morris MA.
    Langmuir; 2014 Sep 09; 30(35):10728-39. PubMed ID: 25137566
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  • 16. Solvent Vapor Annealing of a Diblock Copolymer Thin Film with a Nonselective and a Selective Solvent: Importance of Pathway for the Morphological Changes.
    Jung FA, Berezkin AV, Tejsner TB, Posselt D, Smilgies DM, Papadakis CM.
    Macromol Rapid Commun; 2020 Jul 09; 41(14):e2000150. PubMed ID: 32548931
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  • 17. Systematic study on the effect of solvent removal rate on the morphology of solvent vapor annealed ABA triblock copolymer thin films.
    Albert JN, Young WS, Lewis RL, Bogart TD, Smith JR, Epps TH.
    ACS Nano; 2012 Jan 24; 6(1):459-66. PubMed ID: 22148749
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  • 18. Macroscopic vertical alignment of nanodomains in thin films of semiconductor amphiphilic block copolymers.
    Brendel JC, Liu F, Lang AS, Russell TP, Thelakkat M.
    ACS Nano; 2013 Jul 23; 7(7):6069-78. PubMed ID: 23746109
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