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PUBMED FOR HANDHELDS

Journal Abstract Search

381 related items for PubMed ID: 25111901

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  • 5. Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assembly.
    Borah D, Rasappa S, Senthamaraikannan R, Holmes JD, Morris MA.
    Langmuir; 2013 Jul 16; 29(28):8959-68. PubMed ID: 23751134
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  • 8. Controlled Anisotropic Wetting by Plasma Treatment for Directed Self-Assembly of High-χ Block Copolymers.
    Putranto AF, Petit-Etienne C, Cavalaglio S, Cabannes-Boué B, Panabiere M, Forcina G, Fleury G, Kogelschatz M, Zelsmann M.
    ACS Appl Mater Interfaces; 2024 May 29; 16(21):27841-27849. PubMed ID: 38758246
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  • 9. Carbohydrate-based block copolymer systems: directed self-assembly for nanolithography applications.
    Otsuka I, Nilsson N, Suyatin DB, Maximov I, Borsali R.
    Soft Matter; 2017 Oct 18; 13(40):7406-7411. PubMed ID: 28959807
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  • 10. Enhancing the Directed Self-assembly Kinetics of Block Copolymers Using Binary Solvent Mixtures.
    Park WI, Choi YJ, Yun JM, Hong SW, Jung YS, Kim KH.
    ACS Appl Mater Interfaces; 2015 Nov 25; 7(46):25843-50. PubMed ID: 26517005
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  • 13. Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line-Space Patterning.
    Legrain A, Fleury G, Mumtaz M, Navarro C, Arias-Zapata J, Chevalier X, Cayrefourcq I, Zelsmann M.
    ACS Appl Mater Interfaces; 2017 Dec 13; 9(49):43043-43050. PubMed ID: 29182294
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  • 19. Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers.
    Pound-Lana G, Bézard P, Petit-Etienne C, Cavalaglio S, Cunge G, Cabannes-Boué B, Fleury G, Chevalier X, Zelsmann M.
    ACS Appl Mater Interfaces; 2021 Oct 20; 13(41):49184-49193. PubMed ID: 34636239
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