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248 related items for PubMed ID: 25137566
1. Study of the kinetics and mechanism of rapid self-assembly in block copolymer thin films during solvo-microwave annealing. Mokarian-Tabari P, Cummins C, Rasappa S, Simao C, Sotomayor Torres CM, Holmes JD, Morris MA. Langmuir; 2014 Sep 09; 30(35):10728-39. PubMed ID: 25137566 [Abstract] [Full Text] [Related]
2. Deconvoluting the mechanism of microwave annealing of block copolymer thin films. Jin C, Murphy JN, Harris KD, Buriak JM. ACS Nano; 2014 Apr 22; 8(4):3979-91. PubMed ID: 24655292 [Abstract] [Full Text] [Related]
3. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application. Cummins C, Mokarian-Tabari P, Andreazza P, Sinturel C, Morris MA. ACS Appl Mater Interfaces; 2016 Mar 22; 8(12):8295-304. PubMed ID: 26950246 [Abstract] [Full Text] [Related]
4. Defining Swelling Kinetics in Block Copolymer Thin Films: The Critical Role of Temperature and Vapour Pressure Ramp. Neppalli SN, Collins TW, Gholamvand Z, Cummins C, Morris MA, Mokarian-Tabari P. Polymers (Basel); 2021 Dec 03; 13(23):. PubMed ID: 34883741 [Abstract] [Full Text] [Related]
5. Swift nanopattern formation of PS-b-PMMA and PS-b-PDMS block copolymer films using a microwave assisted technique. Borah D, Senthamaraikannan R, Rasappa S, Kosmala B, Holmes JD, Morris MA. ACS Nano; 2013 Aug 27; 7(8):6583-96. PubMed ID: 23859379 [Abstract] [Full Text] [Related]
6. Fast assembly of ordered block copolymer nanostructures through microwave annealing. Zhang X, Harris KD, Wu NL, Murphy JN, Buriak JM. ACS Nano; 2010 Nov 23; 4(11):7021-9. PubMed ID: 20964379 [Abstract] [Full Text] [Related]
7. Structural transitions in asymmetric poly(styrene)-block-poly(lactide) thin films induced by solvent vapor exposure. Sinturel C, Grosso D, Boudot M, Amenitsch H, Hillmyer MA, Pineau A, Vayer M. ACS Appl Mater Interfaces; 2014 Aug 13; 6(15):12146-52. PubMed ID: 25000367 [Abstract] [Full Text] [Related]
8. Micrometer-Scale Ordering of Silicon-Containing Block Copolymer Thin Films via High-Temperature Thermal Treatments. Giammaria TJ, Ferrarese Lupi F, Seguini G, Perego M, Vita F, Francescangeli O, Wenning B, Ober CK, Sparnacci K, Antonioli D, Gianotti V, Laus M. ACS Appl Mater Interfaces; 2016 Apr 20; 8(15):9897-908. PubMed ID: 27020526 [Abstract] [Full Text] [Related]
9. Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer. Huang W, Luo C, Zhang J, Han Y. J Chem Phys; 2007 Mar 14; 126(10):104901. PubMed ID: 17362081 [Abstract] [Full Text] [Related]
10. Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process. Borah D, Shaw MT, Holmes JD, Morris MA. ACS Appl Mater Interfaces; 2013 Mar 14; 5(6):2004-12. PubMed ID: 23421383 [Abstract] [Full Text] [Related]
11. Widely Tunable Morphologies in Block Copolymer Thin Films Through Solvent Vapor Annealing Using Mixtures of Selective Solvents. Chavis MA, Smilgies DM, Wiesner UB, Ober CK. Adv Funct Mater; 2015 May 27; 25(20):3057-3065. PubMed ID: 26819574 [Abstract] [Full Text] [Related]
14. Well-Ordered Nanoporous ABA Copolymer Thin Films via Solvent Vapor Annealing, Homopolymer Blending, and Selective Etching of ABAC Tetrablock Terpolymers. Jackson EA, Lee Y, Radlauer MR, Hillmyer MA. ACS Appl Mater Interfaces; 2015 Dec 16; 7(49):27331-9. PubMed ID: 26642426 [Abstract] [Full Text] [Related]
15. Coupling of microphase separation and dewetting in weakly segregated diblock co-polymer ultrathin films. Yan D, Huang H, He T, Zhang F. Langmuir; 2011 Oct 04; 27(19):11973-80. PubMed ID: 21870883 [Abstract] [Full Text] [Related]