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Journal Abstract Search

631 related items for PubMed ID: 25494474

  • 21. Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics.
    Lee J, Ravichandran AV, Mohan J, Cheng L, Lucero AT, Zhu H, Che Z, Catalano M, Kim MJ, Wallace RM, Venugopal A, Choi W, Colombo L, Kim J.
    ACS Appl Mater Interfaces; 2020 Aug 12; 12(32):36688-36694. PubMed ID: 32667778
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  • 24. Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma.
    Knoops HC, Braeken EM, de Peuter K, Potts SE, Haukka S, Pore V, Kessels WM.
    ACS Appl Mater Interfaces; 2015 Sep 09; 7(35):19857-62. PubMed ID: 26305370
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  • 27. Nitrogen-doped ZnO thin films grown on glass substrates by atomic layer deposition using NH3 as a doping source.
    Lee DH, Kim HS, Noh SJ.
    J Nanosci Nanotechnol; 2011 Jan 09; 11(1):391-5. PubMed ID: 21446462
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  • 29. Characterization of nitride thin films by electron backscatter diffraction.
    Trager-Cowan C, Sweeney F, Hastie J, Manson-Smith SK, Cowan DA, McColl D, Mohammed A, O'Donnell KP, Zubia D, Hersee SD, Foxon CT, Harrison I, Novikov SV.
    J Microsc; 2002 Mar 09; 205(Pt 3):226-30. PubMed ID: 11996185
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  • 32. Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films.
    Kerrigan MM, Klesko JP, Blakeney KJ, Winter CH.
    ACS Appl Mater Interfaces; 2018 Apr 25; 10(16):14200-14208. PubMed ID: 29630338
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  • 34. Thin-film barrier performance of zirconium oxide using the low-temperature atomic layer deposition method.
    Duan Y, Sun F, Yang Y, Chen P, Yang D, Duan Y, Wang X.
    ACS Appl Mater Interfaces; 2014 Mar 26; 6(6):3799-804. PubMed ID: 24598603
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  • 38. Growth of La1-xSrxFeO3 thin films by atomic layer deposition.
    Lie M, Nilsen O, Fjellvåg H, Kjekshus A.
    Dalton Trans; 2009 Jan 21; (3):481-9. PubMed ID: 19122905
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