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Journal Abstract Search

321 related items for PubMed ID: 25942926

  • 1. The effect of inductively-coupled-plasma reactive ion etching power on the etching rate and the surface roughness of a sapphire substrate.
    Chang CM, Shiao MH, Yang CT, Cheng CT, Hsueh WJ.
    J Nanosci Nanotechnol; 2014 Oct; 14(10):8074-8. PubMed ID: 25942926
    [Abstract] [Full Text] [Related]

  • 2. The sub-micron hole array in sapphire produced by inductively-coupled plasma reactive ion etching.
    Shiao MH, Chang CM, Huang SW, Lee CT, Wu TC, Hsueh WJ, Ma KJ, Chiang D.
    J Nanosci Nanotechnol; 2012 Feb; 12(2):1641-4. PubMed ID: 22630019
    [Abstract] [Full Text] [Related]

  • 3. Patterning of light-extraction nanostructures on sapphire substrates using nanoimprint and ICP etching with different masking materials.
    Chen H, Zhang Q, Chou SY.
    Nanotechnology; 2015 Feb 27; 26(8):085302. PubMed ID: 25648720
    [Abstract] [Full Text] [Related]

  • 4. Development of controlled nanosphere lithography technology.
    Osipov AA, Gagaeva AE, Speshilova AB, Endiiarova EV, Bespalova PG, Osipov AA, Belyanov IA, Tyurikov KS, Tyurikova IA, Alexandrov SE.
    Sci Rep; 2023 Feb 27; 13(1):3350. PubMed ID: 36849515
    [Abstract] [Full Text] [Related]

  • 5. Understanding anisotropic plasma etching of two-dimensional polystyrene opals for advanced materials fabrication.
    Akinoglu EM, Morfa AJ, Giersig M.
    Langmuir; 2014 Oct 21; 30(41):12354-61. PubMed ID: 24580644
    [Abstract] [Full Text] [Related]

  • 6. Nanopattern transfer from high-density self-assembled nanosphere arrays on prepatterned substrates.
    Oshima H, Tamura H, Takeuchi M, Inomata A, Yanagida Y, Matsushita N, Komoriya H, Uzumaki T, Tanaka A.
    Nanotechnology; 2009 Nov 11; 20(45):455303. PubMed ID: 19834244
    [Abstract] [Full Text] [Related]

  • 7. Effect of the Fabrication Parameters of the Nanosphere Lithography Method on the Properties of the Deposited Au-Ag Nanoparticle Arrays.
    Liu J, Chen C, Yang G, Chen Y, Yang CF.
    Materials (Basel); 2017 Apr 03; 10(4):. PubMed ID: 28772741
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  • 11. The fabrication of high-aspect-ratio, size-tunable nanopore arrays by modified nanosphere lithography.
    Chen X, Wei X, Jiang K.
    Nanotechnology; 2009 Oct 21; 20(42):425605. PubMed ID: 19779228
    [Abstract] [Full Text] [Related]

  • 12. Combined AFM nano-machining and reactive ion etching to fabricate high aspect ratio structures.
    Peng P, Shi T, Liao G, Tang Z.
    J Nanosci Nanotechnol; 2010 Nov 21; 10(11):7287-90. PubMed ID: 21137916
    [Abstract] [Full Text] [Related]

  • 13. Enhancement of Efficiency of a Solar Cell Fabricated on Black Si Made by Inductively Coupled Plasma-Reactive Ion Etching Process: A Case Study of a n-CdS/p-Si Heterojunction Cell.
    Katiyar AK, Mukherjee S, Zeeshan M, Ray SK, Raychaudhuri AK.
    ACS Appl Mater Interfaces; 2015 Oct 28; 7(42):23445-53. PubMed ID: 26451949
    [Abstract] [Full Text] [Related]

  • 14. Enhanced light output from the nano-patterned InP semiconductor substrate through the nanoporous alumina mask.
    Jung M, Kim JH, Lee S, Jang BJ, Lee WY, Oh YM, Park SW, Woo D.
    J Nanosci Nanotechnol; 2012 Jul 28; 12(7):5747-53. PubMed ID: 22966647
    [Abstract] [Full Text] [Related]

  • 15. Controllable Fabrication of Non-Close-Packed Colloidal Nanoparticle Arrays by Ion Beam Etching.
    Yang J, Zhang M, Lan X, Weng X, Shu Q, Wang R, Qiu F, Wang C, Yang Y.
    Nanoscale Res Lett; 2018 Jun 11; 13(1):177. PubMed ID: 29892834
    [Abstract] [Full Text] [Related]

  • 16. Surface plasmon resonance tuning of silver nanoparticle array produced by nanosphere lithography through ion etching and thermal annealing.
    Baek KH, Kim JH, Lee KB, Ahnn HS, Yoon CS.
    J Nanosci Nanotechnol; 2010 May 11; 10(5):3118-22. PubMed ID: 20358908
    [Abstract] [Full Text] [Related]

  • 17. Model for large-area monolayer coverage of polystyrene nanospheres by spin coating.
    Chandramohan A, Sibirev NV, Dubrovskii VG, Petty MC, Gallant AJ, Zeze DA.
    Sci Rep; 2017 Jan 19; 7():40888. PubMed ID: 28102358
    [Abstract] [Full Text] [Related]

  • 18. Wafer-scale fabrication of plasmonic crystals from patterned silicon templates prepared by nanosphere lithography.
    Hall AS, Friesen SA, Mallouk TE.
    Nano Lett; 2013 Jun 12; 13(6):2623-7. PubMed ID: 23614608
    [Abstract] [Full Text] [Related]

  • 19. Moiré Nanosphere Lithography.
    Chen K, Rajeeva BB, Wu Z, Rukavina M, Dao TD, Ishii S, Aono M, Nagao T, Zheng Y.
    ACS Nano; 2015 Jun 23; 9(6):6031-40. PubMed ID: 26022616
    [Abstract] [Full Text] [Related]

  • 20. Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching.
    Gonçalves MR, Makaryan T, Enderle F, Wiedemann S, Plettl A, Marti O, Ziemann P.
    Beilstein J Nanotechnol; 2011 Jun 23; 2():448-58. PubMed ID: 22003451
    [Abstract] [Full Text] [Related]

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