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PUBMED FOR HANDHELDS

Journal Abstract Search


328 related items for PubMed ID: 26642426

  • 1.
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  • 2. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application.
    Cummins C, Mokarian-Tabari P, Andreazza P, Sinturel C, Morris MA.
    ACS Appl Mater Interfaces; 2016 Mar; 8(12):8295-304. PubMed ID: 26950246
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  • 3. Ultrafiltration membranes with a thin poly(styrene)-b-poly(isoprene) selective layer.
    Querelle SE, Jackson EA, Cussler EL, Hillmyer MA.
    ACS Appl Mater Interfaces; 2013 Jun 12; 5(11):5044-50. PubMed ID: 23687980
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  • 4. Poly(cyclohexylethylene)-block-Poly(lactide) Oligomers for Ultrasmall Nanopatterning Using Atomic Layer Deposition.
    Yao L, Oquendo LE, Schulze MW, Lewis RM, Gladfelter WL, Hillmyer MA.
    ACS Appl Mater Interfaces; 2016 Mar 23; 8(11):7431-9. PubMed ID: 26954771
    [Abstract] [Full Text] [Related]

  • 5. Structural transitions in asymmetric poly(styrene)-block-poly(lactide) thin films induced by solvent vapor exposure.
    Sinturel C, Grosso D, Boudot M, Amenitsch H, Hillmyer MA, Pineau A, Vayer M.
    ACS Appl Mater Interfaces; 2014 Aug 13; 6(15):12146-52. PubMed ID: 25000367
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  • 6. Pathways of cylindrical orientations in PS-b-P4VP diblock copolymer thin films upon solvent vapor annealing.
    Gowd EB, Koga T, Endoh MK, Kumar K, Stamm M.
    Soft Matter; 2014 Oct 21; 10(39):7753-61. PubMed ID: 25142254
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  • 11. Controlling the size of nanostructures in thin films via blending of block copolymers and homopolymers.
    Peng J, Gao X, Wei Y, Wang H, Li B, Han Y.
    J Chem Phys; 2005 Mar 15; 122(11):114706. PubMed ID: 15836242
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  • 12. Perpendicular Structure Formation of Block Copolymer Thin Films during Thermal Solvent Vapor Annealing: Solvent and Thickness Effects.
    Yang Q, Loos K.
    Polymers (Basel); 2017 Oct 18; 9(10):. PubMed ID: 30965824
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  • 13. Assembling Vertical Block Copolymer Nanopores via Solvent Vapor Annealing on Homopolymer-Functionalized Substrates.
    Bellini B, Willard JR, Cetindag S, Tsai EHR, Li R, Kisslinger K, Kumar SK, Doerk GS.
    ACS Appl Mater Interfaces; 2024 Jul 10; 16(27):35541-35553. PubMed ID: 38920286
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  • 14. Control of the morphology of linear and cyclic PS-b-PI block copolymer micelles via PS addition.
    Ouarti N, Viville P, Lazzaroni R, Minatti E, Schappacher M, Deffieux A, Borsali R.
    Langmuir; 2005 Feb 15; 21(4):1180-6. PubMed ID: 15697258
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  • 15. In situ electrochemical monitoring of selective etching in ordered mesoporous block-copolymer templates.
    Crossland EJ, Cunha P, Ludwigs S, Hillmyer MA, Steiner U.
    ACS Appl Mater Interfaces; 2011 May 15; 3(5):1375-9. PubMed ID: 21491943
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  • 16. Nanoscale rings fabricated using self-assembled triblock terpolymer templates.
    Chuang VP, Ross CA, Bilalis P, Hadjichristidis N.
    ACS Nano; 2008 Oct 28; 2(10):2007-14. PubMed ID: 19206445
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  • 17. Order and Disorder in ABCA' Tetrablock Terpolymers.
    Radlauer MR, Arora A, Matta ME, Bates FS, Dorfman KD, Hillmyer MA.
    J Phys Chem B; 2020 Nov 12; 124(45):10266-10275. PubMed ID: 33136393
    [Abstract] [Full Text] [Related]

  • 18. Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer.
    Lee S, Cheng LC, Gadelrab KR, Ntetsikas K, Moschovas D, Yager KG, Avgeropoulos A, Alexander-Katz A, Ross CA.
    ACS Nano; 2018 Jun 26; 12(6):6193-6202. PubMed ID: 29856599
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  • 19. Highly ordered nanoporous template from triblock copolymer.
    Lee DH, Park S, Gu W, Russell TP.
    ACS Nano; 2011 Feb 22; 5(2):1207-14. PubMed ID: 21291282
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  • 20. Ordering evolution of block copolymer thin films upon solvent-annealing process.
    Lee DH, Cho H, Yoo S, Park S.
    J Colloid Interface Sci; 2012 Oct 01; 383(1):118-23. PubMed ID: 22789801
    [Abstract] [Full Text] [Related]


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