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Journal Abstract Search

265 related items for PubMed ID: 27166838

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  • 4. Top-Down Integration of Molybdenum Disulfide Transistors with Wafer-Scale Uniformity and Layer Controllability.
    Shi ML, Chen L, Zhang TB, Xu J, Zhu H, Sun QQ, Zhang DW.
    Small; 2017 Sep; 13(35):. PubMed ID: 28639331
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  • 7. Low-Temperature Atomic Layer Deposition of MoS2 Films.
    Jurca T, Moody MJ, Henning A, Emery JD, Wang B, Tan JM, Lohr TL, Lauhon LJ, Marks TJ.
    Angew Chem Int Ed Engl; 2017 Apr 24; 56(18):4991-4995. PubMed ID: 28371057
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  • 12. Highly Uniform Atomic Layer-Deposited MoS2@3D-Ni-Foam: A Novel Approach To Prepare an Electrode for Supercapacitors.
    Nandi DK, Sahoo S, Sinha S, Yeo S, Kim H, Bulakhe RN, Heo J, Shim JJ, Kim SH.
    ACS Appl Mater Interfaces; 2017 Nov 22; 9(46):40252-40264. PubMed ID: 29099166
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  • 13. Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition.
    Shih HY, Lin MC, Chen LY, Chen MJ.
    Nanotechnology; 2015 Jan 09; 26(1):014002. PubMed ID: 25494474
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  • 16. A novel 2-step ALD route to ultra-thin MoS2 films on SiO2 through a surface organometallic intermediate.
    Cadot S, Renault O, Frégnaux M, Rouchon D, Nolot E, Szeto K, Thieuleux C, Veyre L, Okuno H, Martin F, Quadrelli EA.
    Nanoscale; 2017 Jan 05; 9(2):538-546. PubMed ID: 27762415
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  • 17. Layer-controlled, wafer-scale, and conformal synthesis of tungsten disulfide nanosheets using atomic layer deposition.
    Song JG, Park J, Lee W, Choi T, Jung H, Lee CW, Hwang SH, Myoung JM, Jung JH, Kim SH, Lansalot-Matras C, Kim H.
    ACS Nano; 2013 Dec 23; 7(12):11333-40. PubMed ID: 24252136
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  • 18. Wafer-Scale Synthesis of Reliable High-Mobility Molybdenum Disulfide Thin Films via Inhibitor-Utilizing Atomic Layer Deposition.
    Jeon W, Cho Y, Jo S, Ahn JH, Jeong SJ.
    Adv Mater; 2017 Dec 23; 29(47):. PubMed ID: 29094458
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  • 19. Wafer-Scale Integration of Highly Uniform and Scalable MoS2 Transistors.
    Kim Y, Kim AR, Zhao G, Choi SY, Kang SC, Lim SK, Lee KE, Park J, Lee BH, Hahm MG, Kim DH, Yun J, Lee KH, Cho B.
    ACS Appl Mater Interfaces; 2017 Oct 25; 9(42):37146-37153. PubMed ID: 28976735
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  • 20. Toolbox of Advanced Atomic Layer Deposition Processes for Tailoring Large-Area MoS2 Thin Films at 150 °C.
    Mattinen M, Schulpen JJPM, Dawley RA, Gity F, Verheijen MA, Kessels WMM, Bol AA.
    ACS Appl Mater Interfaces; 2023 Jul 26; 15(29):35565-35579. PubMed ID: 37459249
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